Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MLYCD | O95822 | 13/20 | 0.36 |
| ▸ | NR1H3 | Q13133 | 2/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | SCN9A | Q15858 | 3/20 | 0.32 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14838551 | 0.88 | SCN9A (0.41) | NPSR1SCN9A | |
| SCHEMBL14839101 | 0.85 | HMGCR (0.33) | SMN1; SMN2 | |
| SCHEMBL18610621 | 0.84 | MLYCD (0.36) | MLYCDNR1H3GAAMAPK1SMN1; SMN2 | |
| SCHEMBL23433026 | 0.84 | MLYCD (0.34) | MLYCDNR1H3GAAMAPK1SMN1; SMN2 | |
| SCHEMBL11913011 | 0.76 | ELANE (0.37) | MLYCDNR1H3SMN1; SMN2LMNANR1H2 | |
| SCHEMBL26458262 | 0.75 | ELANE (0.31) | — | |
| SCHEMBL18772335 | 0.74 | ELANE (0.40) | — | |
| SCHEMBL18487391 | 0.73 | MAPT (0.45) | MAPK1SMN1; SMN2LMNAHTTNPSR1 | |
| SCHEMBL19901519 | 0.73 | POLB (0.44) | GAALMNA | |
| SCHEMBL18030078 | 0.73 | LMNA (0.35) | MLYCDNR1H3GAAMAPK1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20200201177-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2020-06-25 | — | — | US | disclosed |
| US-20200050106-A1 | PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2020-02-13 | — | — | US | disclosed |