SCHEMBL1483976

SCHEMBL1483976

O=[PH](ON1CCNCC1)ON1CCNCC1

nearest known ligand 0.31

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
▸ CA2 P00918 2/20 0.31
▸ CA12 O43570 1/20 0.31
▸ CA1 P00915 1/20 0.31
▸ CA9 Q16790 1/20 0.31
▸ CHKA P35790 1/20 0.30
▸ KDM4E B2RXH2 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27299909 0.81 — —
SCHEMBL9510802 0.80 — —
SCHEMBL29291379 0.80 — —
SCHEMBL29009380 0.75 LTA4H (0.42) —
SCHEMBL29015823 0.74 HRH2 (0.33) —
SCHEMBL1674539 0.69 — —
SCHEMBL11564684 0.67 HIF1A (0.33) CA2CA12CA1CA9CHKA
Hydrochloric Acid SCHEMBL27445441 0.65 ALDH1A1 (0.35) CA2CA12CA1CA9KDM4E
SCHEMBL205893 0.65 — —
SCHEMBL5874622 0.63 CA2 (0.41) CA2CA12CA1CA9CHKA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114805652-A Flame-retardant PMMA resin material, composite material and preparation method thereof 北玻院(滕州)复合材料有限公司 2022-07-29 — — CN claimed
CN-109942824-B Nitrogen-containing phosphonate flame retardant and synthetic method thereof 黑龙江科技大学 2021-07-09 — — CN claimed
US-20080029126-A1 Compositions and methods for improved planarization of copper utilizing inorganic oxide abrasive ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. 2008-02-07 — — US claimed
US-6971945-B2 Multi-step polishing solution for chemical mechanical planarization ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) 2005-12-06 — — US claimed
US-20050194357-A1 MULTI-STEP POLISHING SOLUTION FOR CHEMICAL MECHANICAL PLANARIZATION ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. 2005-09-08 — — US claimed
EP-1548076-A1 Compositions and methods for low downforce pressure polishing of copper Rohm and Haas Electronic Materials CMP Holdings, Inc. (US) 2005-06-29 — — EP claimed
US-20050136671-A1 Compositions and methods for low downforce pressure polishing of copper ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. 2005-06-23 — — US claimed
US-4540508-A PIPERAZINE DERIVATIVES THE DOW CHEMICAL COMPANY (US) 1985-09-10 — — US claimed
US-3954761-A SCALE AND CORROSION INHIBITORS PETROLITE CORPORATION (US) 1976-05-04 — — US claimed
CN-114805652-B Flame-retardant PMMA resin material, composite material and preparation method thereof 北玻院(滕州)复合材料有限公司 2023-10-13 — — CN disclosed
CN-115975296-A Halogen-free flame-retardant polyolefin composition and preparation method thereof 北京航天凯恩新材料有限公司 2023-04-18 — — CN disclosed
CN-115819453-A Phosphorus-containing epoxy curing agent and preparation method thereof 河南昇阳生物科技有限公司 2023-03-21 — — CN disclosed
CN-114805652-A Flame-retardant PMMA resin material, composite material and preparation method thereof 北玻院(滕州)复合材料有限公司 2022-07-29 — — CN disclosed
CN-109942824-B Nitrogen-containing phosphonate flame retardant and synthetic method thereof 黑龙江科技大学 2021-07-09 — — CN disclosed
US-5500419-A NMDA antagonists MERRELL DOW PHARMACEUTICALS INC. (US) 1996-03-19 — — US disclosed
EP-0418863-B1 NMDA antagonists MERRELL DOW PHARMA (US) 1995-01-04 — — EP disclosed
US-5326756-A R-4-oxo-5 phosphononorvaline used as NMDA antagonists MERRELL DOW PHARMACEUTICALS INC. (US) 1994-07-05 — — US disclosed
US-5095009-A NMDA antagonists MERRELL DOW PHARMACEUTICALS INC. (US) 1992-03-10 — — US disclosed
EP-0418863-A2 NMDA antagonists MERRELL DOW PHARMACEUTICALS INC. (US) 1991-03-27 — — EP disclosed
US-3954761-A SCALE AND CORROSION INHIBITORS PETROLITE CORPORATION (US) 1976-05-04 — — US disclosed
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