SCHEMBL1484124

SCHEMBL1484124

O=S(=O)(OS(c1ccccc1)(c1ccccc1)c1ccccc1)C(F)(F)C(F)(F)CO

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 4/20 0.40
TSHR P16473 2/20 0.38
ABCC9 O60706 2/20 0.38
ABCC8 Q09428 2/20 0.38
KCNJ11 Q14654 2/20 0.38
KCNJ8 Q15842 2/20 0.38
MEN1 O00255 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP3A4 P08684 1/20 0.38
CYP2D6 P10635 1/20 0.38
CYP2C19 P33261 1/20 0.38
KMT2A Q03164 1/20 0.38
HTR6 P50406 1/20 0.36
RORC P51449 5/20 0.35
NR1I2 O75469 5/20 0.35
SMN1; SMN2 Q16637 1/20 0.34
NR1H3 Q13133 4/20 0.34
NR1H2 P55055 3/20 0.33
RORA P35398 2/20 0.33
RORB Q92753 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1656350 0.88 HSD11B1 (0.38) HSD11B1TSHRABCC9ABCC8KCNJ11
SCHEMBL1533291 0.85 HSD11B1 (0.36) HSD11B1TSHRABCC9ABCC8KCNJ11
SCHEMBL1772470 0.84 HSD11B1 (0.35) HSD11B1TSHRABCC9ABCC8KCNJ11
SCHEMBL501412 0.83 HSD11B1 (0.38) HSD11B1TSHRABCC9ABCC8KCNJ11
SCHEMBL2437767 0.81 HTR6 (0.38) HSD11B1TSHRHTR6SMN1; SMN2NR1H3
SCHEMBL217002 0.81 HTR6 (0.38) HSD11B1TSHRHTR6SMN1; SMN2NR1H3
SCHEMBL962839 0.81 HSD11B1 (0.41) HSD11B1TSHRABCC9ABCC8KCNJ11
SCHEMBL37033 0.79 HTR6 (0.42) HSD11B1TSHRHTR6SMN1; SMN2NR1H3
SCHEMBL965951 0.78 CA1 (0.39) HSD11B1TSHRABCC9ABCC8KCNJ11
SCHEMBL51400 0.77 CA1 (0.43) HSD11B1HTR6NR1I2NR1H3NR1H2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8940471-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-01-27 US disclosed
US-20110076615-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-03-31 US disclosed