Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 5/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | FYN | P06241 | 1/20 | 0.40 |
| ▸ | MAOB | P27338 | 2/20 | 0.39 |
| ▸ | POLB | P06746 | 2/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | APEX1 | P27695 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.36 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.36 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.36 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | NR1I2 | O75469 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12227199 | 0.90 | L3MBTL1 (0.45) | L3MBTL1MAPTGAAMAOBPOLB | |
| SCHEMBL7640912 | 0.82 | PARP10 (0.43) | L3MBTL1MAPTGAAMAOBPOLB | |
| SCHEMBL657699 | 0.80 | L3MBTL1 (0.66) | L3MBTL1MAPTGAAMAOBPOLB | |
| SCHEMBL3589633 | 0.80 | NQO1 (0.50) | MAPTFYNMAOBTDP1 | |
| SCHEMBL9312577 | 0.79 | NQO1 (0.61) | L3MBTL1MAPTMAOBLMNANPSR1 | |
| SCHEMBL7639971 | 0.78 | MAOB (0.43) | MAOBPRSS1RAB9A | |
| SCHEMBL686115 | 0.78 | FYN (0.36) | L3MBTL1MAPTFYNMAOBPARP10 | |
| SCHEMBL9549256 | 0.78 | KMT2A (0.53) | L3MBTL1MAPTGAAFYNLMNA | |
| SCHEMBL3798190 | 0.78 | CES2 (0.59) | L3MBTL1MAPTGAAFYNPOLB | |
| SCHEMBL11019446 | 0.78 | L3MBTL1 (0.42) | L3MBTL1MAPTGAAMAOBPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 80 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6465150-B1 | COMPRISING AN AROMATIC SULFONIC ACID ONIUM SALT COMPOUND ACID GENERATOR, FOR EXAMPLE, 2,4-DIFLUOROBENZENESULFONIC ACID ANION AND AN ONIUM CATION OF SULFUR OR IODONIUM, AND A COPOLYMER REPRESENTED BY 4-HYDROXYSTYRENE/4-T-BUTOXYSTYRENE COPOLYMER | JSR CORPORATION (JP) | 2002-10-15 | — | — | US | claimed |
| JP-6065317-A | — | — | None | — | — | JP | disclosed |
| JP-6032819-A | — | — | None | — | — | JP | disclosed |
| US-20180022916-A1 | METHOD OF PREPARING POLYMER COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| US-20180024433-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| US-9405187-B2 | Salt, acid generator and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9405187-B2 | Salt, acid generator and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9260407-B2 | Salt and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-16 | — | — | US | disclosed |
| US-9260407-B2 | Salt and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-16 | — | — | US | disclosed |
| US-9229320-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| US-20110076617-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-31 | — | — | US | disclosed |
| US-20110076617-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-31 | — | — | US | disclosed |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| WO-2007120012-A1 | NOVEL COMPOUNDS, ISOMER THEREOF, OR PHARMACEUTICALLY ACCEPTABLE SALTS THEREOF AS VANILLOID RECEPTOR ANTAGONIST; AND PHARMACEUTICAL COMPOSITIONS CONTAINING THE SAME | AMOREPACIFIC CORPORATION (KR) | 2007-10-25 | — | — | WO | disclosed |
| US-6465150-B1 | COMPRISING AN AROMATIC SULFONIC ACID ONIUM SALT COMPOUND ACID GENERATOR, FOR EXAMPLE, 2,4-DIFLUOROBENZENESULFONIC ACID ANION AND AN ONIUM CATION OF SULFUR OR IODONIUM, AND A COPOLYMER REPRESENTED BY 4-HYDROXYSTYRENE/4-T-BUTOXYSTYRENE COPOLYMER | JSR CORPORATION (JP) | 2002-10-15 | — | — | US | disclosed |
| US-5412050-A | Polymer having a narrow dispersion of molecular weight and a manufacturing process thereof | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-05-02 | — | — | US | disclosed |
| US-5352564-A | Copolymer of styrene derivatives, an acid release agent and a dissolution inhibitor containing an unstable acid group | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1994-10-04 | — | — | US | disclosed |
| JP-H0665317-A | POLY@(3754/24)P-METHOXYMETHOXY-ALPHA-METHYLSTYRENE) AND ITS PRODUCTION | SHIN ETSU CHEM CO LTD | 1994-03-08 | — | — | JP | disclosed |
| JP-H0632819-A | PRODUCTION OF POLY@(3754/24)P-HYDROXY-ALPHA-METHYLSTYRENE) | SHIN ETSU CHEM CO LTD | 1994-02-08 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110065040-A1 | PHOTORESIST COMPOSITION | C1R, P4HA1, C1S | L3MBTL1 2000/4885MAPT 1824/4885GAA 4227/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.