SCHEMBL14883102

SCHEMBL14883102

Cc1cc(Cl)c(C(=O)OCCC2CCCCC2)c(Cl)c1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 4/20 0.40
MEN1 O00255 3/20 0.40
KMT2A Q03164 3/20 0.40
SCN9A Q15858 5/20 0.40
CHRM2 P08172 2/20 0.40
CHRM4 P08173 2/20 0.40
CHRM5 P08912 2/20 0.40
CHRM1 P11229 2/20 0.40
CHRM3 P20309 2/20 0.40
PTGS2 P35354 1/20 0.40
HPGD P15428 1/20 0.39
NPC1 O15118 4/20 0.38
POLB P06746 1/20 0.38
GAA P10253 1/20 0.37
PKM P14618 1/20 0.37
HTT P42858 1/20 0.37
TP53 P04637 2/20 0.36
P2RX7 Q99572 1/20 0.36
TSHR P16473 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14883131 0.87 KMT2A (0.39) RAB9AKMT2ASCN9ACHRM2CHRM4
SCHEMBL14543605 0.83 SCN9A (0.40) RAB9AMEN1KMT2ASCN9ACHRM2
SCHEMBL14883067 0.83 NPC1 (0.52) RAB9ASCN9ACHRM2CHRM4CHRM5
SCHEMBL107374 0.81 L3MBTL1 (0.43) RAB9AMEN1KMT2ACHRM2CHRM4
SCHEMBL14883132 0.81 MEN1 (0.41) RAB9AMEN1KMT2ASCN9ACHRM2
SCHEMBL14883103 0.81 ESR1 (0.43) RAB9AKMT2ASCN9ACHRM2CHRM4
SCHEMBL12406573 0.80 RAB9A (0.36) RAB9AMEN1KMT2ASCN9ACHRM2
SCHEMBL14883127 0.78 SCN9A (0.41) RAB9AMEN1KMT2ASCN9ACHRM2
SCHEMBL14883129 0.77 ALDH1A1 (0.46) RAB9AMEN1KMT2ACHRM2CHRM4
SCHEMBL16247834 0.77 L3MBTL1 (0.40) RAB9AMEN1KMT2ACHRM2CHRM4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8927194-B2 Chemical amplified photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-01-06 US disclosed
US-20130177851-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-11 US disclosed
US-20130101940-A1 CHEMICAL AMPLIFIED PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-04-25 US disclosed