SCHEMBL14907285

SCHEMBL14907285

CC(C)(C)OC(=O)N(OC(C)(C)C)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
NPSR1 Q6W5P4 2/20 0.40
CYP2C19 P33261 2/20 0.40
RAB9A P51151 1/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2C9 P11712 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
L3MBTL1 Q9Y468 2/20 0.38
TDP1 Q9NUW8 2/20 0.38
ATM Q13315 1/20 0.38
BRD4 O60885 1/20 0.38
PAX8 Q06710 1/20 0.37
GSK3B P49841 1/20 0.37
ALDH1A1 P00352 1/20 0.37
TSHR P16473 1/20 0.37
HSD17B10 Q99714 1/20 0.37
AKT1 P31749 2/20 0.36
GPR119 Q8TDV5 1/20 0.36
HDAC3 O15379 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25866708 0.86 MEN1 (0.40) MEN1KMT2ANPSR1CYP2C19RAB9A
SCHEMBL8706596 0.83 MEN1 (0.38) MEN1KMT2ANPSR1CYP2C19RAB9A
SCHEMBL23849578 0.83 L3MBTL1 (0.56) MEN1KMT2ANPSR1CYP2C19RAB9A
SCHEMBL29024419 0.81 TP53 (0.42) MEN1KMT2ANPSR1CYP2C19RAB9A
SCHEMBL9571669 0.81 RAB9A (0.42) RAB9ACYP3A4TDP1ALDH1A1GPR119
SCHEMBL8736767 0.79 MEN1 (0.43) MEN1KMT2ANPSR1CYP2C19RAB9A
SCHEMBL504005 0.79 L3MBTL1 (0.55) MEN1KMT2ANPSR1CYP2C19RAB9A
SCHEMBL18051150 0.79 L3MBTL1 (0.54) MEN1KMT2ANPSR1CYP2C19CYP3A4
SCHEMBL7200107 0.78 RAB9A (0.57) MEN1KMT2ANPSR1RAB9ASMN1; SMN2
SCHEMBL7363893 0.78 KDM4E (0.45) MEN1KMT2ANPSR1CYP2C19RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2013062066-A1 PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED FILM FOR ORGANIC SOLVENT DEVELOPMENT, RESIST COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-05-02 WO disclosed