SCHEMBL14985997

SCHEMBL14985997

COc1cccc(B2OCCO2)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE P22303 1/20 0.44
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
CA7 P43166 1/20 0.42
CA9 Q16790 1/20 0.42
ALDH1A1 P00352 1/20 0.42
CYP3A4 P08684 1/20 0.42
CES2 O00748 1/20 0.39
CES1 P23141 1/20 0.39
ENPP2 Q13822 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
CHRM5 P08912 1/20 0.38
ADRB1 P08588 1/20 0.38
IDO1 P14902 1/20 0.37
AGXT P21549 1/20 0.37
NPC1 O15118 1/20 0.37
RAB9A P51151 1/20 0.37
PARP1 P09874 1/20 0.37
RELA Q04206 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6826334 0.93 ACHE (0.41) ACHECA1CA2CA7CA9
SCHEMBL19417354 0.83 SNCA (0.49) ACHECA1CA2CA7CA9
SCHEMBL7853010 0.82 ACHE (0.48) ACHECA1CA2CA7CA9
SCHEMBL12767294 0.82 ADRB1 (0.48) ALDH1A1ADRB1NPC1RAB9A
SCHEMBL24835198 0.79 RELA (0.35) ACHECA1CA2CA7CA9
SCHEMBL14985983 0.77 KCNH2 (0.38) ALDH1A1
SCHEMBL422395 0.76 LPL (0.49) ACHECA1CA2CA7CA9
SCHEMBL14983500 0.76 CA1 (0.48) ACHECA1CA2CA7CA9
SCHEMBL17421920 0.75 ACHE (0.41) ACHECA1CA2CA7CA9
SCHEMBL6828907 0.75 TP53 (0.45) ALDH1A1CYP3A4NPC1RAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8945820-B2 Silicon-containing resist underlayer film-forming composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-03 US disclosed
US-20130137271-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-30 US disclosed