SCHEMBL15043136

SCHEMBL15043136

CCC(C)(CCOCOCc1ccccc1)C(=O)OC

nearest known ligand 0.40

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.40
KMT2A Q03164 3/20 0.40
MMP8 P22894 2/20 0.40
PTPRB P23467 1/20 0.40
KDM4E B2RXH2 1/20 0.40
MAPT P10636 1/20 0.40
RIPK1 Q13546 1/20 0.38
LMNA P02545 2/20 0.38
HPGD P15428 1/20 0.38
SMN1; SMN2 Q16637 3/20 0.38
ALDH1A1 P00352 2/20 0.37
HTT P42858 1/20 0.37
KCNN4 O15554 1/20 0.37
TSHR P16473 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
PPARA Q07869 1/20 0.37
MMP1 P03956 1/20 0.36
MMP3 P08254 1/20 0.36
MMP9 P14780 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27267828 0.79 MEN1 (0.45) MEN1KMT2AMMP8PTPRBLMNA
SCHEMBL21231919 0.79 MEN1 (0.45) MEN1KMT2AMMP8PTPRBLMNA
SCHEMBL4956050 0.78 RIPK1 (0.45) MEN1KMT2AMMP8PTPRBMAPT
SCHEMBL12360944 0.76 MEN1 (0.43) MEN1KMT2AMMP8PTPRBKDM4E
SCHEMBL15043134 0.76 DGAT1 (0.31)
SCHEMBL3270827 0.75 MMP8 (0.53) MEN1KMT2AMMP8PTPRBRIPK1
SCHEMBL6743375 0.74 PTPRB (0.43) MEN1KMT2APTPRBMAPTSMN1; SMN2
SCHEMBL1691112 0.73 PTPRB (0.52) MEN1KMT2APTPRBKDM4ERIPK1
SCHEMBL24533735 0.73 MAPT (0.47) MEN1KMT2AKDM4EMAPTLMNA
SCHEMBL16591102 0.73 RIPK1 (0.46) MEN1KMT2AMMP8KDM4EMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9057949-B2 Patterning process, resist composition, polymer, and polymerizable ester compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-16 US disclosed
US-20130157194-A1 PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND POLYMERIZABLE ESTER COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-06-20 US disclosed