Indene

Indene

SCHEMBL2770682

C1=Cc2ccccc2C1.C=Cc1ccc(OC(OC)C(C)C)cc1.C=Cc1ccccc1O

nearest known ligand 0.30

Full drug profile on Sugi Atlas →

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 1/20 0.30
CYP2C19 P33261 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Indene SCHEMBL2568213 0.87 KDM4E (0.32) CYP2D6CYP2C19
Indene SCHEMBL2772146 0.86
SCHEMBL2771513 0.86 ABL1 (0.37) CYP2D6CYP2C19
Indene SCHEMBL15048570 0.85 RELA (0.40) CYP2D6CYP2C19
Indene SCHEMBL2773974 0.83
SCHEMBL547158 0.82 RELA (0.32)
Indene SCHEMBL15048613 0.81 CYP2C19 (0.39) CYP2D6CYP2C19
Indene SCHEMBL6053432 0.80 MAPT (0.39) CYP2D6CYP2C19
SCHEMBL5383989 0.79 ABL1 (0.32)
Indene SCHEMBL546792 0.78 CYP2D6 (0.39) CYP2D6CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1783551-B1 Resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2010-04-14 EP disclosed
US-7618763-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-17 US disclosed
US-20070105042-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-10 US disclosed
EP-1783551-A2 Resist composition and patterning process Shinetsu Chemical Co., Ltd. (JP) 2007-05-09 EP disclosed