Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NR4A1 | P22736 | 1/20 | 0.52 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.52 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.43 |
| ▸ | PRNP | P04156 | 1/20 | 0.42 |
| ▸ | CDC25B | P30305 | 2/20 | 0.42 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.39 |
| ▸ | HPGD | P15428 | 3/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.39 |
| ▸ | ATIC | P31939 | 1/20 | 0.39 |
| ▸ | KDM4A | O75164 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.39 |
| ▸ | HIF1AN | Q9NWT6 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1506782 | 0.89 | NR4A1 (0.47) | NR4A1NR4A2NR4A3ALDH1A1ALOX15 | |
| SCHEMBL31518427 | 0.89 | NR4A1 (0.47) | NR4A1NR4A2NR4A3ALDH1A1ALOX15 | |
| SCHEMBL7537971 | 0.82 | NR4A1 (0.53) | NR4A1NR4A2NR4A3ALDH1A1ALOX15 | |
| SCHEMBL13091101 | 0.81 | SLC9A1 (0.35) | NR4A1NR4A2NR4A3ALDH1A1PRNP | |
| Ethylene SCHEMBL23142699 | 0.81 | NR4A1 (0.67) | NR4A1NR4A2NR4A3ALDH1A1ALOX15 | |
| SCHEMBL27985 | 0.81 | NR4A1 (0.73) | NR4A1NR4A2NR4A3ALDH1A1ALOX15 | |
| SCHEMBL29406795 | 0.81 | NR4A1 (0.73) | NR4A1NR4A2NR4A3ALDH1A1ALOX15 | |
| SCHEMBL31100 | 0.79 | ALDH1A1 (0.56) | NR4A1NR4A2NR4A3ALDH1A1ALOX15 | |
| SCHEMBL30259301 | 0.79 | ALDH1A1 (0.56) | NR4A1NR4A2NR4A3ALDH1A1ALOX15 | |
| Benzene SCHEMBL28254104 | 0.79 | ALDH1A1 (0.56) | NR4A1NR4A2NR4A3ALDH1A1ALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108699380-B | Granulating stabilizer for multi-color pattern coating | 圣诺普科有限公司 | 2021-09-03 | — | — | CN | disclosed |
| US-9075308-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-07 | — | — | US | disclosed |
| US-8841061-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-23 | — | — | US | disclosed |
| US-8822588-B2 | Fluorine-containing polymer and anti-static agent wherein same is used | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-09-02 | — | — | US | disclosed |
| US-8808966-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20140045122-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-13 | — | — | US | disclosed |
| US-8574817-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-8513457-B2 | Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-08-20 | — | — | US | disclosed |
| US-8507175-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-13 | — | — | US | disclosed |
| US-8507175-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-13 | — | — | US | disclosed |
| US-20110065857-A1 | Fluorine-Containing Polymer and Anti-Static Agent Wherein Same is Used | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| EP-2289954-A1 | FLUORINE-CONTAINING POLYMER AND ANTI-STATIC AGENT WHEREIN SAME IS USED | Central Glass Company, Limited (JP) | 2011-03-02 | — | — | EP | disclosed |
| US-20110014566-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-20 | — | — | US | disclosed |
| US-20110014566-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-20 | — | — | US | disclosed |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-01-08 | — | — | US | disclosed |
| EP-0849634-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6322949-B2 | SULFONIUM COMPOUND AS PHOTOACID GENERATOR | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | FGFR2, RTF1, ADGRF1 | NR4A1 2593/4885NR4A2 2856/4885NR4A3 2983/4885 |
| US-20110014566-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | XPA, NPPA, ERCC4 | NR4A1 905/4885NR4A2 1786/4885NR4A3 1802/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.