SCHEMBL1506782

SCHEMBL1506782

C=Cc1ccc(C(=O)O)c2ccccc12

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR4A1 P22736 1/20 0.47
NR4A2 P43354 1/20 0.47
NR4A3 Q92570 1/20 0.47
WDR5 P61964 1/20 0.44
KDM4E B2RXH2 6/20 0.43
ALDH1A1 P00352 3/20 0.43
HPGD P15428 2/20 0.43
LDHA P00338 1/20 0.43
ALOX15 P16050 1/20 0.43
CYP2C9 P11712 1/20 0.43
TSHR P16473 1/20 0.43
ALOX12 P18054 1/20 0.43
ATIC P31939 1/20 0.43
HSD17B10 Q99714 1/20 0.43
CDC25B P30305 2/20 0.39
THRB P10828 1/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
L3MBTL1 Q9Y468 2/20 0.39
PRNP P04156 1/20 0.39
LMNA P02545 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31518427 1.00 NR4A1 (0.47) NR4A1NR4A2NR4A3WDR5KDM4E
SCHEMBL1506767 0.89 NR4A1 (0.52) NR4A1NR4A2NR4A3KDM4EALDH1A1
SCHEMBL2649947 0.82 NR4A1 (0.48) NR4A1NR4A2NR4A3WDR5KDM4E
SCHEMBL29957209 0.82 NR4A1 (0.48) NR4A1NR4A2NR4A3WDR5KDM4E
SCHEMBL14748507 0.82 NR4A1 (0.46) NR4A1NR4A2NR4A3WDR5KDM4E
Ethylene SCHEMBL4597009 0.81 NR4A1 (0.60) NR4A1NR4A2NR4A3WDR5KDM4E
SCHEMBL28798 0.81 NR4A1 (0.65) NR4A1NR4A2NR4A3WDR5KDM4E
SCHEMBL30838413 0.81 NR4A1 (0.65) NR4A1NR4A2NR4A3WDR5KDM4E
SCHEMBL30838412 0.81 NR4A1 (0.65) NR4A1NR4A2NR4A3WDR5KDM4E
SCHEMBL29406630 0.81 NR4A1 (0.65) NR4A1NR4A2NR4A3WDR5KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525450-A QUATERNARY AMMONIUM AND ACID GROUP CONTAINING POLYMER SEGMENTS IN NONPOLAR LIQUID XEROX CORPORATION (US) 1996-06-11 US claimed
US-20250388625-A1 CYCLOSPORINE ANALOGUES UCL BUSINESS LTD (GB) 2025-12-25 US disclosed
US-20250320238-A1 TRANSITION METAL CLUSTER COMPOUND, PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING SUBSTRATE MITSUBISHI CHEMICAL CORPORATION (JP) 2025-10-16 US disclosed
EP-4543902-A1 CYCLOSPORINE ANALOGUES UCL Business Ltd (GB) 2025-04-30 EP disclosed
WO-2024142879-A1 TRANSITION METAL CLUSTER COMPOUND, PHOTOSENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND METHOD FOR PRODUCING CIRCUIT BOARD 三菱ケミカル株式会社 2024-07-04 WO disclosed
WO-2023247937-A1 CYCLOSPORINE ANALOGUES UCL BUSINESS LTD (GB) 2023-12-28 WO disclosed
CN-110505874-B Molecules having pesticidal utility, and intermediates, compositions and methods related thereto 科迪华农业科技有限责任公司 2023-09-26 CN disclosed
CN-108699022-B Molecules having pesticidal utility, and intermediates, compositions and methods related to these molecules 美国陶氏益农公司 2021-11-09 CN disclosed
CN-109152363-B Molecules having pesticidal utility, and intermediates, compositions and methods related to these molecules 美国陶氏益农公司 2021-10-15 CN disclosed
CN-108882704-B Molecules having pesticidal utility, and intermediates, compositions and methods related to these molecules 美国陶氏益农公司 2021-09-10 CN disclosed
US-20110014566-A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-01-20 US disclosed
US-20110014566-A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-01-20 US disclosed
US-20090011199-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2009-01-08 US disclosed
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed
US-5573882-A POLAR AND NONPOLAR SEGMENTS XEROX CORPORATION (US) 1996-11-12 US disclosed
US-5525450-A QUATERNARY AMMONIUM AND ACID GROUP CONTAINING POLYMER SEGMENTS IN NONPOLAR LIQUID XEROX CORPORATION (US) 1996-06-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20250388625-A1 CYCLOSPORINE ANALOGUES MALT1, CHP1, CCR1 NR4A1 303/4885NR4A2 1064/4885NR4A3 1010/4885
US-20090011199-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same FGFR2, RTF1, ADGRF1 NR4A1 2593/4885NR4A2 2856/4885NR4A3 2983/4885
US-20110014566-A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME XPA, NPPA, ERCC4 NR4A1 905/4885NR4A2 1786/4885NR4A3 1802/4885
US-20250320238-A1 TRANSITION METAL CLUSTER COMPOUND, PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING SUBSTRATE TYR, MITF, TRPA1 NR4A1 261/4885NR4A2 334/4885NR4A3 579/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.