SCHEMBL15081256

SCHEMBL15081256

O=C(Cl)c1ccc(N2C(=O)C=C(c3ccccc3)C2=O)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA12 O43570 6/20 0.43
▸ CA9 Q16790 6/20 0.43
▸ CA1 P00915 4/20 0.43
▸ CA2 P00918 1/20 0.43
▸ SCN2A Q99250 1/20 0.43
▸ NPSR1 Q6W5P4 4/20 0.41
▸ ALDH1A1 P00352 3/20 0.41
▸ MAPT P10636 3/20 0.41
▸ GAA P10253 2/20 0.41
▸ HPGD P15428 2/20 0.41
▸ ALOX12 P18054 2/20 0.41
▸ CCR6 P51684 2/20 0.41
▸ CACNA1B Q00975 2/20 0.41
▸ APBA1 Q02410 2/20 0.41
▸ FAAH O00519 1/20 0.40
▸ MGLL Q99685 1/20 0.40
▸ DDAH1 O94760 1/20 0.39
▸ KDM4E B2RXH2 1/20 0.38
▸ PPARA Q07869 1/20 0.38
▸ LMNA P02545 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13900311 0.88 CA12 (0.57) CA12CA9CA1CA2SCN2A
SCHEMBL9967354 0.85 MAPT (0.50) CA12CA9CA1CA2SCN2A
SCHEMBL303331 0.82 ALDH1A1 (0.51) NPSR1ALDH1A1MAPTGAAHPGD
SCHEMBL1471657 0.81 MAPT (0.54) NPSR1ALDH1A1MAPTGAAHPGD
SCHEMBL28170453 0.81 NPSR1 (0.47) NPSR1ALDH1A1MAPTGAAHPGD
SCHEMBL1471161 0.80 MAPT (0.50) NPSR1ALDH1A1MAPTGAAHPGD
SCHEMBL1471136 0.78 MGLL (0.47) CA12CA9CA1CA2SCN2A
SCHEMBL1473687 0.78 MGLL (0.47) NPSR1ALDH1A1MAPTGAAHPGD
SCHEMBL1471189 0.78 ALDH1A1 (0.57) NPSR1ALDH1A1MAPTGAAHPGD
SCHEMBL28976650 0.78 ALDH1A1 (0.45) NPSR1ALDH1A1MAPTGAAHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8785103-B2 Photosensitive novolac resin, positive photosensitive resin composition including same, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film CHEIL INDUSTRIES INC. (KR) 2014-07-22 — — US disclosed
US-8785103-B2 Photosensitive novolac resin, positive photosensitive resin composition including same, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film CHEIL INDUSTRIES INC. (KR) 2014-07-22 — — US disclosed
US-20130171563-A1 Photosensitive Novolac Resin, Positive Photosensitive Resin Composition Including Same, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film CHEIL INDUSTRIES INC. (KR) 2013-07-04 — — US disclosed
US-20130171563-A1 Photosensitive Novolac Resin, Positive Photosensitive Resin Composition Including Same, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film CHEIL INDUSTRIES INC. (KR) 2013-07-04 — — US disclosed
Send feedback