Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 4/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.47 |
| ▸ | CA9 | Q16790 | 2/20 | 0.43 |
| ▸ | CA12 | O43570 | 1/20 | 0.43 |
| ▸ | CA1 | P00915 | 1/20 | 0.43 |
| ▸ | CA2 | P00918 | 1/20 | 0.43 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.43 |
| ▸ | NPC1 | O15118 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 3/20 | 0.41 |
| ▸ | GAA | P10253 | 2/20 | 0.41 |
| ▸ | CCR6 | P51684 | 2/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.41 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.41 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.41 |
| ▸ | APBA1 | Q02410 | 1/20 | 0.41 |
| ▸ | ADAM17 | P78536 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13900311 | 0.88 | CA12 (0.57) | MAPTSMN1; SMN2ALDH1A1CA9CA12 | |
| SCHEMBL10884164 | 0.86 | KMT2A (0.40) | MAPTSMN1; SMN2ALDH1A1CA9CA12 | |
| SCHEMBL15081256 | 0.85 | CA12 (0.43) | MAPTALDH1A1CA9CA12CA1 | |
| SCHEMBL303331 | 0.82 | ALDH1A1 (0.51) | MAPTALDH1A1KMT2AMEN1HPGD | |
| SCHEMBL13900316 | 0.82 | GLA (0.51) | MAPTSMN1; SMN2ALDH1A1NPC1RAB9A | |
| SCHEMBL1471189 | 0.81 | ALDH1A1 (0.57) | MAPTSMN1; SMN2ALDH1A1KMT2AMEN1 | |
| SCHEMBL28170453 | 0.81 | NPSR1 (0.47) | MAPTSMN1; SMN2ALDH1A1KMT2AHPGD | |
| SCHEMBL1471161 | 0.80 | MAPT (0.50) | MAPTALDH1A1NPC1RAB9AKMT2A | |
| SCHEMBL1473687 | 0.78 | MGLL (0.47) | MAPTALDH1A1NPC1KMT2AMEN1 | |
| SCHEMBL1471657 | 0.78 | MAPT (0.54) | MAPTALDH1A1NPC1RAB9AKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9023559-B2 | Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film | CHEIL INDUSTRIES INC. (KR) | 2015-05-05 | — | — | US | disclosed |
| US-8841064-B2 | Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film | CHEIL INDUSTRIES INC. (KR) | 2014-09-23 | — | — | US | disclosed |
| US-8815489-B2 | Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film | CHEIL INDUSTRIES INC. (KR) | 2014-08-26 | — | — | US | disclosed |
| US-8785103-B2 | Photosensitive novolac resin, positive photosensitive resin composition including same, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film | CHEIL INDUSTRIES INC. (KR) | 2014-07-22 | — | — | US | disclosed |
| US-20130171563-A1 | Photosensitive Novolac Resin, Positive Photosensitive Resin Composition Including Same, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film | CHEIL INDUSTRIES INC. (KR) | 2013-07-04 | — | — | US | disclosed |
| US-20130137036-A1 | Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film | CHEIL INDUSTRIES INC. (KR) | 2013-05-30 | — | — | US | disclosed |
| US-8420287-B2 | Positive photosensitive resin composition | CHEIL INDUSTRIES INC. (KR) | 2013-04-16 | — | — | US | disclosed |
| US-20120171610-A1 | Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film | CHEIL INDUSTRIES INC. (KR) | 2012-07-05 | — | — | US | disclosed |
| US-20120171614-A1 | Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film | CHEIL INDUSTRIES INC. (KR) | 2012-07-05 | — | — | US | disclosed |
| US-20120171609-A1 | Positive Photosensitive Resin Composition, Photosensitive Resin Layer Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Layer | CHEIL INDUSTRIES INC. (KR) | 2012-07-05 | — | — | US | disclosed |
| US-20120156614-A1 | Novel Phenol Compounds and Positive Photosensitive Resin Composition Including the Same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-06-21 | — | — | US | disclosed |
| US-20110111346-A1 | Positive Photosensitive Resin Composition | CHEIL INDUSTRIES INC. (KR) | 2011-05-12 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120156614-A1 | Novel Phenol Compounds and Positive Photosensitive Resin Composition Including the Same | SUN2, TYR, PSMD2 | MAPT 1621/4885SMN1; SMN2 4759/4885ALDH1A1 1848/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.