SCHEMBL15082071

SCHEMBL15082071

c1ccc(SN2CCOCCOCCOCC2)cc1

nearest known ligand 0.52

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.52
MAPT P10636 3/20 0.47
PKM P14618 2/20 0.47
ALDH1A1 P00352 4/20 0.46
HPGD P15428 2/20 0.46
ALOX15 P16050 2/20 0.46
HSD17B10 Q99714 2/20 0.46
KDM4E B2RXH2 1/20 0.46
FKBP1A P62942 1/20 0.45
NPC1 O15118 1/20 0.42
USP2 O75604 1/20 0.42
RAB9A P51151 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
MGLL Q99685 1/20 0.41
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
NPSR1 Q6W5P4 2/20 0.40
KCNA5 P22460 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9579555 0.98 MAPT (0.49) LMNAMAPTPKMALDH1A1HPGD
SCHEMBL11798954 0.87 MGLL (0.48) LMNAMAPTPKMALDH1A1HPGD
SCHEMBL19478738 0.80 SMN1; SMN2 (0.47) LMNAMAPTPKMALDH1A1FKBP1A
SCHEMBL610091 0.79 HPGD (0.60) LMNAMAPTALDH1A1HPGDALOX15
SCHEMBL11851834 0.78 MAPT (0.64) LMNAMAPTPKMALDH1A1HPGD
SCHEMBL2058891 0.78 ALDH1A1 (0.50) MAPTALDH1A1HPGDHSD17B10NPC1
SCHEMBL24894095 0.78 SMN1; SMN2 (0.49) LMNAMAPTPKMALDH1A1FKBP1A
SCHEMBL20108451 0.78 KMT2A (0.49) LMNAMAPTPKMALDH1A1HPGD
SCHEMBL24893972 0.78 FKBP1A (0.49) MAPTALDH1A1HPGDHSD17B10KDM4E
SCHEMBL24893956 0.78 MAPT (0.41) MAPTPKMALDH1A1HPGDALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9188862-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same FUJIFILM CORPORATION (JP) 2015-11-17 US disclosed
US-9188862-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same FUJIFILM CORPORATION (JP) 2015-11-17 US disclosed
US-20140295332-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME FUJIFILM CORPORATION (JP) 2014-10-02 US disclosed
US-20140295332-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME FUJIFILM CORPORATION (JP) 2014-10-02 US disclosed
WO-2013100158-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME FUJIFILM CORPORATION (JP) 2013-07-04 WO disclosed