Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6262984 | 0.97 | HSD11B1 (0.38) | HSD11B1CYP2C9 | |
| SCHEMBL14954535 | 0.75 | NOS1 (0.30) | — | |
| SCHEMBL476499 | 0.74 | HSD11B1 (0.39) | HSD11B1CYP2C9 | |
| SCHEMBL22462244 | 0.74 | HSD11B1 (0.50) | HSD11B1CYP2C9 | |
| SCHEMBL159996 | 0.74 | HSD11B1 (0.50) | HSD11B1CYP2C9 | |
| SCHEMBL2768476 | 0.71 | CYP2C9 (0.40) | CYP2C9 | |
| SCHEMBL678974 | 0.69 | HSD11B1 (0.50) | HSD11B1CYP2C9 | |
| SCHEMBL21048748 | 0.69 | HSD11B1 (0.50) | HSD11B1CYP2C9 | |
| SCHEMBL2825487 | 0.69 | HSD11B1 (0.44) | HSD11B1CYP2C9 | |
| SCHEMBL16567928 | 0.69 | HSD11B1 (0.50) | HSD11B1CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1592 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10301515-B2 | Easily dismantlable adhesive composition and easily dismantlable adhesive tape | DIC CORPORATION (JP) | 2019-05-28 | — | — | US | claimed |
| CN-107848947-A | Fluorochemical, living polymerization initiator, fluoropolymer, the manufacture method of fluoropolymer and anti-corrosion agent composition | DIC株式会社 | 2018-03-27 | — | — | CN | claimed |
| EP-1536285-B1 | Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition | FUJIFILM CORP (JP) | 2016-01-06 | — | — | EP | claimed |
| EP-2486453-B1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | AZ ELECTRONIC MATERIALS USA (US) | 2014-01-29 | — | — | EP | claimed |
| EP-1693705-B1 | Positive resist composition and pattern forming method using the resist composition | FUJIFILM CORP (JP) | 2014-01-22 | — | — | EP | claimed |
| EP-2413195-B1 | Pattern forming method | FUJIFILM CORP (JP) | 2013-08-28 | — | — | EP | claimed |
| EP-2486453-A1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | AZ Electronic Materials USA Corp. (US) | 2012-08-15 | — | — | EP | claimed |
| US-8206886-B2 | Photosensitive composition and pattern-forming method using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2012-06-26 | — | — | US | claimed |
| US-8158326-B2 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition | FUJIFILM CORPORATION (JP) | 2012-04-17 | — | — | US | claimed |
| US-8124803-B2 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-28 | — | — | US | claimed |
| EP-1143299-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-10-10 | — | — | EP | claimed |
| EP-1128212-A2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-29 | — | — | EP | claimed |
| US-20010016298-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-23 | — | — | US | claimed |
| US-20010014428-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-16 | — | — | US | claimed |
| EP-1122604-A2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-08 | — | — | EP | claimed |
| US-6239231-B1 | HAS THE POLYMERIZATION UNIT OF 2-ALKYL-2-ADAMANTYL (METH)ACRYLATE AND ONE OR BOTH OF THE POLYMERIZATION UNIT OF 3-HYDROXY-1-ADAMANTYL (METH)ACRYLATE OR (METH)ACRYLONITRILE; ACID GENERATOR; SEMICONDUCTORS | SUMITOMO CHEMICAL, COMPANY LIMITED (JP) | 2001-05-29 | — | — | US | claimed |
| EP-1041442-A1 | Chemical amplification type positive resist | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-10-04 | — | — | EP | claimed |
| EP-1020767-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-07-19 | — | — | EP | claimed |
| EP-0982628-A2 | A chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-03-01 | — | — | EP | claimed |
| US-6013416-A | FILMS FOR PHOTORESISTS PATTERNS | FUJITSU LIMITED (JP) | 2000-01-11 | — | — | US | claimed |