Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | CXCR3 | P49682 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22462244 | 0.74 | HSD11B1 (0.50) | HSD11B1CYP2C9CXCR3 | |
| SCHEMBL150989 | 0.74 | HSD11B1 (0.39) | HSD11B1CYP2C9 | |
| SCHEMBL159996 | 0.74 | HSD11B1 (0.50) | HSD11B1CYP2C9CXCR3 | |
| SCHEMBL6262984 | 0.72 | HSD11B1 (0.38) | HSD11B1CYP2C9 | |
| SCHEMBL678974 | 0.69 | HSD11B1 (0.50) | HSD11B1CYP2C9CXCR3 | |
| SCHEMBL39664 | 0.69 | HSD11B1 (0.44) | HSD11B1CYP2C9CXCR3 | |
| SCHEMBL16567928 | 0.69 | HSD11B1 (0.50) | HSD11B1CYP2C9CXCR3 | |
| SCHEMBL21048748 | 0.69 | HSD11B1 (0.50) | HSD11B1CYP2C9CXCR3 | |
| SCHEMBL8669289 | 0.69 | HSD11B1 (0.35) | HSD11B1 | |
| SCHEMBL6657914 | 0.67 | HSD11B1 (0.42) | HSD11B1CYP2C9CXCR3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 189 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117945957-A | Photoacid generating compounds and related polymers, photoresist compositions, and methods of forming photoresist relief images | 罗门哈斯电子材料有限责任公司 | 2024-04-30 | — | — | CN | disclosed |
| US-11204552-B2 | Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent | JSR CORPORATION (JP) | 2021-12-21 | — | — | US | disclosed |
| CN-106187964-B | Acid generator compound and photoresist comprising the same | 罗门哈斯电子材料有限责任公司 | 2021-04-06 | — | — | CN | disclosed |
| US-20200041902-A9 | RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND RADIATION-SENSITIVE ACID GENERATING AGENT | JSR CORPORATION (JP) | 2020-02-06 | — | — | US | disclosed |
| US-10088750-B2 | Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method | JSR CORPORATION (JP) | 2018-10-02 | — | — | US | disclosed |
| US-20180267406-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND RADIATION-SENSITIVE ACID GENERATING AGENT | JSR CORPORATION (JP) | 2018-09-20 | — | — | US | disclosed |
| US-9874816-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2018-01-23 | — | — | US | disclosed |
| US-20170363961-A9 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-12-21 | — | — | US | disclosed |
| US-20170131632-A1 | ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD | JSR CORPORATION (JP) | 2017-05-11 | — | — | US | disclosed |
| US-9588423-B2 | Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method | JSR CORPORATION (JP) | 2017-03-07 | — | — | US | disclosed |
| EP-1347335-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-09-24 | — | — | EP | disclosed |
| EP-1341038-A2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-09-03 | — | — | EP | disclosed |
| US-20030134224-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-07-17 | — | — | US | disclosed |
| US-20030134225-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-07-17 | — | — | US | disclosed |
| EP-1319981-A2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-06-18 | — | — | EP | disclosed |
| EP-1296190-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-03-26 | — | — | EP | disclosed |
| EP-1273969-A2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-01-08 | — | — | EP | disclosed |
| US-20020168584-A1 | Photopolymerization using acid generator | FUJI PHOTO FILM CO., LTD. | 2002-11-14 | — | — | US | disclosed |
| EP-1243968-A2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-09-25 | — | — | EP | disclosed |
| US-20020061464-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2002-05-23 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170131632-A1 | ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD | RER1, RFC4, RFC2 | HSD11B1 2435/4885CYP2C9 2789/4885CXCR3 3227/4885 |
| US-11204552-B2 | Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent | NOS1, ADCY1, IFNAR1 | HSD11B1 1737/4885CYP2C9 2888/4885CXCR3 1179/4885 |
| US-10088750-B2 | Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method | RER1, RFC4, RFC2 | HSD11B1 2435/4885CYP2C9 2789/4885CXCR3 3227/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.