Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | DRD4 | P21917 | 1/20 | 0.38 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.33 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.33 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.33 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.33 |
| ▸ | PIM1 | P11309 | 1/20 | 0.33 |
| ▸ | HKDC1 | Q2TB90 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | SHBG | P04278 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8351615 | 0.88 | KDM4E (0.35) | KDM4EALDH1A1HPGDHSD17B10DRD4 | |
| SCHEMBL16597206 | 0.88 | ERBB2 (0.39) | KDM4EALDH1A1HPGDHSD17B10DRD4 | |
| SCHEMBL5516684 | 0.88 | KDM4E (0.38) | KDM4EALDH1A1HPGDHSD17B10DRD4 | |
| SCHEMBL4175469 | 0.87 | KDM4E (0.33) | KDM4EALDH1A1HPGDHSD17B10DRD4 | |
| SCHEMBL11056777 | 0.80 | HPGD (0.35) | KDM4EALDH1A1HPGDHSD17B10DRD4 | |
| SCHEMBL217886 | 0.80 | KDM4E (0.31) | KDM4EALDH1A1HPGDHSD17B10GABRA1 | |
| SCHEMBL12766214 | 0.79 | KDM4E (0.33) | KDM4EALDH1A1HPGDHSD17B10DRD4 | |
| SCHEMBL217789 | 0.79 | KDM4E (0.33) | KDM4EALDH1A1HPGDHSD17B10DRD4 | |
| SCHEMBL13025134 | 0.79 | KDM4E (0.37) | KDM4EALDH1A1HPGDHSD17B10DRD4 | |
| SCHEMBL10130972 | 0.78 | CA2 (0.42) | KDM4EALDH1A1HPGDHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 160 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025095045-A1 | TRANSPARENT RESIN COMPOSITION, DRY FILM, CURED PRODUCT, AND ELECTRONIC COMPONENT | 太陽ホールディングス株式会社 | 2025-05-08 | — | — | WO | disclosed |
| WO-2025095046-A1 | RESIN COMPOSITION, DRY FILM, CURED PRODUCT, AND LIGHT EMITTING ELEMENT MOUNTED SUBSTRATE | 太陽ホールディングス株式会社 | 2025-05-08 | — | — | WO | disclosed |
| US-12044968-B2 | Protective film-forming composition having acetal structure and amide structure | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| US-12044968-B2 | Protective film-forming composition having acetal structure and amide structure | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| US-12025916-B2 | Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-02 | — | — | US | disclosed |
| US-12025916-B2 | Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-02 | — | — | US | disclosed |
| US-11815815-B2 | Composition for forming silicon-containing resist underlayer film removable by wet process | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-11-14 | — | — | US | disclosed |
| US-20230359123-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-11-09 | — | — | US | disclosed |
| US-20230359123-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-11-09 | — | — | US | disclosed |
| US-20230350299-A1 | STEP SUBSTRATE COATING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-11-02 | — | — | US | disclosed |
| US-20100316953-A1 | SILOXANE-BASED RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2010-12-16 | — | — | US | disclosed |
| US-20100233619-A1 | NOVEL POLYIMIDE SILICONE, PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE NOVEL POLYIMIDE SILICONE, AND METHOD FOR PATTERN FORMATION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-09-16 | — | — | US | disclosed |
| EP-2228400-A1 | Novel polyimide silicone, photosensitive resin composition containing the novel polyimide silicone, and method for pattern formation | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-09-15 | — | — | EP | disclosed |
| US-7749682-B2 | Alkali-developable black photosensitive resin composition for forming light-shielding barrier wall | NIPPON SHEET GLASS CO., LTD. (JP) | 2010-07-06 | — | — | US | disclosed |
| US-20090111048-A1 | ALKALI-DEVELOPABLE BLACK PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING LIGHT-SHIELDING BARRIER WALL | TAIYO INK MFG.CO., LTD. (JP) | 2009-04-30 | — | — | US | disclosed |
| US-7476476-B2 | Photosensitive resin composition, electronic component using the same, and display unit using the same | TORAY INDUSTRIES, INC. (JP) | 2009-01-13 | — | — | US | disclosed |
| US-20080108723-A1 | Photosensitive Resin Composition | TORAY INDUSTRIES, INC. (JP) | 2008-05-08 | — | — | US | disclosed |
| US-20080108723-A1 | Photosensitive Resin Composition | TORAY INDUSTRIES, INC. (JP) | 2008-05-08 | — | — | US | disclosed |
| US-6773855-B1 | PRINTED CIRCUIT BOARD HAVING A SOLDER RESIST FILM FORMED FROM THE CURED FILM | TAIYO INK MANUFACTURING CO., LTD. (JP) | 2004-08-10 | — | — | US | disclosed |
| US-4436804-A | Light-sensitive polymeric diazonium condensates and reproduction compositions and materials therewith | AMERICAN HOECHST CORPORATION (US) | 1984-03-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100316953-A1 | SILOXANE-BASED RESIN COMPOSITION | ICAM1, ESD, CAD | KDM4E 117/4885ALDH1A1 599/4885HPGD 3057/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.