Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRA2A | P08913 | 4/20 | 0.36 |
| ▸ | ADRA2B | P18089 | 3/20 | 0.36 |
| ▸ | ADRA2C | P18825 | 3/20 | 0.36 |
| ▸ | ADRA1D | P25100 | 2/20 | 0.36 |
| ▸ | ADRA1A | P35348 | 2/20 | 0.36 |
| ▸ | ADRA1B | P35368 | 2/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | PNMT | P11086 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.33 |
| ▸ | AHR | P35869 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | CTSD | P07339 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2472916 | 0.98 | ADRA2A (0.35) | ADRA2AADRA2BADRA2CADRA1DADRA1A | |
| SCHEMBL158373 | 0.83 | NOTUM (0.33) | ADRA2AADRA2BADRA2CPNMT | |
| Methacrylic Acid SCHEMBL16508011 | 0.82 | FEN1 (0.31) | — | |
| SCHEMBL3657958 | 0.80 | DRD2 (0.31) | — | |
| SCHEMBL5133628 | 0.79 | CD44 (0.36) | PNMTLMNA | |
| SCHEMBL116183 | 0.79 | DRD2 (0.42) | PNMTTSHR | |
| SCHEMBL9128476 | 0.79 | — | — | |
| SCHEMBL425781 | 0.79 | ALDH1A1 (0.32) | TSHR | |
| SCHEMBL150109 | 0.79 | AHR (0.33) | AHRTSHRLMNA | |
| SCHEMBL7943734 | 0.78 | PNMT (0.36) | PNMTTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3259 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4004131-B2 | UV INKJET COMPOSITIONS | SUN CHEMICAL BV (NL) | 2025-07-23 | — | — | EP | claimed |
| US-12351721-B2 | Ink jet recording method | SEIKO EPSON CORPORATION (JP) | 2025-07-08 | — | — | US | claimed |
| CN-119747185-A | Photo-curing organic silicon/SiO with micro/nano mastoid structure2Preparation method of super-hydrophobic coating | 浙江理工大学 | 2025-04-04 | — | — | CN | claimed |
| US-12232338-B2 | Low-voltage operation dual-gate organic thin-film transistors and methods of manufacturing thereof | CORNING INCORPORATED (US) | 2025-02-18 | — | — | US | claimed |
| CN-111045296-B | UV patternable polymer blend for organic thin film transistor | 康宁股份有限公司 | 2024-12-27 | — | — | CN | claimed |
| EP-2445722-B2 | PRINTING METHOD | SERICOL LTD (GB) | 2024-09-04 | — | — | EP | claimed |
| US-12071551-B2 | UV-curable ink composition and a UV-cured printing process | SUN CHEMICAL B.V. (NL) | 2024-08-27 | — | — | US | claimed |
| US-12048236-B2 | UV patternable polymer blends for organic thin-film transistors | CORNING INCORPORATED (US) | 2024-07-23 | — | — | US | claimed |
| EP-2711075-B1 | Plasmonic assisted systems and methods for interior energy-activation from an exterior source. | IMMUNOLIGHT LLC (US) | 2024-05-22 | — | — | EP | claimed |
| EP-4196540-B1 | A UV-CURABLE INK COMPOSITION AND A UV-CURED PRINTING PROCESS | SUN CHEMICAL BV (NL) | 2024-04-10 | — | — | EP | claimed |
| EP-0397742-A4 | POROUS ARTICLE IMPREGNATION RESIN COMPOSITION, AND SYSTEM FOR TREATING IMPREGNATION PROCESS WASTE WATER | — | 1991-07-03 | — | — | EP | claimed |
| US-4999136-A | Electroconductive adhesive, acrylated epoxy resin and urethane | WESTINGHOUSE ELECTRIC CORP. (US) | 1991-03-12 | — | — | US | claimed |
| US-4975471-A | Photo-curable epoxy resin type composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1990-12-04 | — | — | US | claimed |
| EP-0397742-A1 | POROUS ARTICLE IMPREGNATION RESIN COMPOSITION, AND SYSTEM FOR TREATING IMPREGNATION PROCESS WASTE WATER. | LOCTITE CORP (US) | 1990-11-22 | — | — | EP | claimed |
| WO-1989006245-A1 | POROUS ARTICLE IMPREGNATION RESIN COMPOSITION, AND SYSTEM FOR TREATING IMPREGNATION PROCESS WASTE WATER | LOCTITE CORPORATION (US) | 1989-07-13 | — | — | WO | claimed |
| EP-0157508-A2 | Thin adhesive sheet for use in working semiconductor wafers | NITTO DENKO CORPORATION (JP) | 1985-10-09 | — | — | EP | claimed |
| US-4451329-A | MASKING WITH A CROSSLINKABLE RESIN | WHEATON INDUSTRIES (US) | 1984-05-29 | — | — | US | claimed |
| US-4368300-A | BONDING, IMPACT STRENGTH | UBE INDUSTRIES, LTD. (JP) | 1983-01-11 | — | — | US | claimed |
| US-4268576-A | PHOTOPOLYMERIZATION WITH ULTRAVIOLET LIGHT | REPEAT-O-TYPE STENCIL MANUFACTURING CO., INC. (US) | 1981-05-19 | — | — | US | claimed |
| US-4227979-A | Radiation-curable coating compositions containing amide acrylate compounds | PPG INDUSTRIES, INC. (US) | 1980-10-14 | — | — | US | claimed |