Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.32 |
| ▸ | ABCC9 | O60706 | 1/20 | 0.30 |
| ▸ | ABCC8 | Q09428 | 1/20 | 0.30 |
| ▸ | KCNJ11 | Q14654 | 1/20 | 0.30 |
| ▸ | KCNJ8 | Q15842 | 1/20 | 0.30 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.30 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.30 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.30 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18785338 | 0.75 | HTT (0.49) | KMT2A | |
| SCHEMBL15383924 | 0.75 | CYP2C19 (0.46) | — | |
| SCHEMBL26063409 | 0.72 | ACACB (0.34) | KMT2AABCC9ABCC8KCNJ11KCNJ8 | |
| SCHEMBL20013841 | 0.72 | ABCC9 (0.31) | KMT2AABCC9ABCC8KCNJ11KCNJ8 | |
| SCHEMBL9944399 | 0.72 | L3MBTL1 (0.45) | KMT2A | |
| SCHEMBL290564 | 0.72 | CDC7 (0.49) | KMT2AHDAC3HDAC4HDAC1HDAC6 | |
| SCHEMBL21617982 | 0.72 | KMT2A (0.38) | KMT2AABCC9ABCC8KCNJ11KCNJ8 | |
| SCHEMBL15216289 | 0.71 | HRH3 (0.36) | KMT2A | |
| SCHEMBL15216284 | 0.71 | NAMPT (0.33) | ABCC9ABCC8KCNJ11KCNJ8HDAC4 | |
| SCHEMBL15216292 | 0.70 | LMNA (0.52) | KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11579529-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-02-14 | — | — | US | disclosed |
| US-20200285152-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-09-10 | — | — | US | disclosed |
| US-8900796-B2 | Acid generator, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-02 | — | — | US | disclosed |
| US-8900796-B2 | Acid generator, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-02 | — | — | US | disclosed |
| US-20130224657-A1 | ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20130224657-A1 | ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200285152-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | POLR1C, EWSR1, LBR | KMT2A 4345/4885ABCC9 3528/4885ABCC8 3904/4885 |
| US-11579529-B2 | Positive resist composition and patterning process | POLR1C, EWSR1, LBR | KMT2A 4345/4885ABCC9 3528/4885ABCC8 3904/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.