Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.48 |
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 7/20 | 0.45 |
| ▸ | ATM | Q13315 | 1/20 | 0.45 |
| ▸ | PLOD2 | O00469 | 1/20 | 0.43 |
| ▸ | PLOD3 | O60568 | 1/20 | 0.43 |
| ▸ | PLOD1 | Q02809 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 3/20 | 0.42 |
| ▸ | THRB | P10828 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | APP | P05067 | 1/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | HCAR3 | P49019 | 1/20 | 0.41 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.41 |
| ▸ | PLA2G7 | Q13093 | 1/20 | 0.41 |
| ▸ | MGLL | Q99685 | 1/20 | 0.41 |
| ▸ | ABHD6 | Q9BV23 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | F7 | P08709 | 1/20 | 0.41 |
| ▸ | F3 | P13726 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22808188 | 0.89 | ALDH1A1 (0.56) | ALDH1A1MAPTKMT2AATMPLOD2 | |
| SCHEMBL15216390 | 0.85 | ALDH1A1 (0.51) | ALDH1A1MAPTKMT2AATMPLOD2 | |
| SCHEMBL15216287 | 0.83 | HSD17B10 (0.41) | ALDH1A1MAPTKMT2APLOD2PLOD3 | |
| SCHEMBL382685 | 0.83 | TSHR (0.47) | ALDH1A1MAPTKMT2ALMNATDP1 | |
| SCHEMBL15210039 | 0.82 | PTGS2 (0.42) | ALDH1A1MAPTKMT2AATMPLOD2 | |
| Hydrogen Sulfide SCHEMBL2882266 | 0.81 | TSHR (0.46) | ALDH1A1MAPTKMT2ALMNATDP1 | |
| SCHEMBL482458 | 0.81 | TSHR (0.46) | ALDH1A1MAPTKMT2ALMNATDP1 | |
| SCHEMBL18785766 | 0.78 | TP53 (0.42) | ALDH1A1MAPTKMT2AATMLMNA | |
| Pyridine SCHEMBL16820464 | 0.77 | SNCA (0.35) | ALDH1A1MAPTKMT2ATDP1PLA2G7 | |
| SCHEMBL27860967 | 0.77 | KMT2A (0.44) | ALDH1A1KMT2ALMNATDP1CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11579529-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-02-14 | — | — | US | disclosed |
| US-20200285152-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-09-10 | — | — | US | disclosed |
| US-8900796-B2 | Acid generator, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-02 | — | — | US | disclosed |
| US-8900796-B2 | Acid generator, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-02 | — | — | US | disclosed |
| US-20130224657-A1 | ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20130224657-A1 | ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200285152-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | POLR1C, EWSR1, LBR | ALDH1A1 4408/4885MAPT 1432/4885KMT2A 4345/4885 |
| US-11579529-B2 | Positive resist composition and patterning process | POLR1C, EWSR1, LBR | ALDH1A1 4408/4885MAPT 1432/4885KMT2A 4345/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.