Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SHBG | P04278 | 1/20 | 0.40 |
| ▸ | EPHX1 | P07099 | 4/20 | 0.38 |
| ▸ | EPHX2 | P34913 | 3/20 | 0.36 |
| ▸ | NAAA | Q02083 | 1/20 | 0.36 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.36 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.36 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.36 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | CTSK | P43235 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6352698 | 0.86 | ALDH1A1 (0.34) | SHBGEPHX1EPHX2NAAACHRM2 | |
| SCHEMBL3784779 | 0.84 | SHBG (0.40) | SHBGEPHX1EPHX2NAAACHRM2 | |
| SCHEMBL3858544 | 0.83 | EPHX1 (0.40) | EPHX1EPHX2NAAAALDH1A1KDM4E | |
| SCHEMBL25022787 | 0.81 | EPHX1 (0.38) | SHBGEPHX1EPHX2NAAACHRM2 | |
| SCHEMBL10885190 | 0.81 | SHBG (0.38) | SHBGEPHX1EPHX2NAAACHRM2 | |
| SCHEMBL29094051 | 0.81 | SHBG (0.42) | SHBGEPHX1EPHX2NAAACHRM2 | |
| SCHEMBL27977643 | 0.81 | SHBG (0.38) | SHBGEPHX1EPHX2NAAACHRM2 | |
| SCHEMBL28766886 | 0.80 | CHRM2 (0.36) | SHBGEPHX1EPHX2NAAACHRM2 | |
| SCHEMBL5988036 | 0.80 | EPHX1 (0.38) | EPHX1EPHX2ALDH1A1NPSR1KDM4E | |
| SCHEMBL27437211 | 0.79 | NPSR1 (0.36) | EPHX1EPHX2ALDH1A1NPSR1CTSK |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9612535-B2 | Pattern forming method, electron beam- or extreme ultraviolet-sensitive resin composition, resist film using the same, method of manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-04-04 | — | — | US | disclosed |
| WO-2013125733-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-08-29 | — | — | WO | disclosed |