SCHEMBL15470537

SCHEMBL15470537

C=Cc1ccc(C(=O)OC(C)(C)C2CC=C(C)CC2)cc1

nearest known ligand 0.46

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.46
CYP3A4 P08684 2/20 0.46
ALOX15 P16050 2/20 0.46
PTPN1 P18031 2/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
STAT3 P40763 2/20 0.38
MAPK1 P28482 1/20 0.38
CHRNA7 P36544 1/20 0.38
CES2 O00748 2/20 0.37
MET P08581 1/20 0.33
TAS1R3 Q7RTX0 1/20 0.32
TAS1R1 Q7RTX1 1/20 0.32
ALDH1A1 P00352 3/20 0.32
TSHR P16473 2/20 0.32
MAPT P10636 1/20 0.32
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5604543 0.84 CES2 (0.51) LMNACYP3A4ALOX15PTPN1MEN1
SCHEMBL22283370 0.83 ELANE (0.46) LMNACYP3A4ALOX15PTPN1MEN1
SCHEMBL2761722 0.80 NPC1 (0.39) MEN1KMT2ATAS1R3TAS1R1ALDH1A1
SCHEMBL25380939 0.79 LMNA (0.59) LMNACYP3A4ALOX15PTPN1MEN1
SCHEMBL15470541 0.78 LMNA (0.51) LMNACYP3A4ALOX15PTPN1MEN1
SCHEMBL15470644 0.78 LMNA (0.41) LMNACYP3A4ALOX15PTPN1MEN1
SCHEMBL25380943 0.78 LMNA (0.57) LMNACYP3A4ALOX15PTPN1MEN1
SCHEMBL24218833 0.78 MEN1 (0.35) LMNAMEN1KMT2ATAS1R3TAS1R1
SCHEMBL15470538 0.77 LMNA (0.40) LMNACYP3A4ALOX15PTPN1MEN1
SCHEMBL14825850 0.76 TAS1R3 (0.40) PTPN1TAS1R3TAS1R1ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9075308-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-07 US disclosed
US-9075308-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-07 US disclosed
US-20140045122-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-02-13 US disclosed
US-20140045122-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-02-13 US disclosed