Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.41 |
| ▸ | ESR1 | P03372 | 1/20 | 0.41 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.41 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.37 |
| ▸ | BACE1 | P56817 | 1/20 | 0.37 |
| ▸ | TUBB4A | P04350 | 1/20 | 0.36 |
| ▸ | TUBB | P07437 | 1/20 | 0.36 |
| ▸ | TUBA3C | P0DPH7 | 1/20 | 0.36 |
| ▸ | TUBA1B | P68363 | 1/20 | 0.36 |
| ▸ | TUBA4A | P68366 | 1/20 | 0.36 |
| ▸ | TUBB4B | P68371 | 1/20 | 0.36 |
| ▸ | TUBB3 | Q13509 | 1/20 | 0.36 |
| ▸ | TUBB2A | Q13885 | 1/20 | 0.36 |
| ▸ | TUBB8 | Q3ZCM7 | 1/20 | 0.36 |
| ▸ | TUBA3E | Q6PEY2 | 1/20 | 0.36 |
| ▸ | TUBA1A | Q71U36 | 1/20 | 0.36 |
| ▸ | TUBA1C | Q9BQE3 | 1/20 | 0.36 |
| ▸ | TUBB6 | Q9BUF5 | 1/20 | 0.36 |
| ▸ | TUBB2B | Q9BVA1 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3024410 | 0.78 | CYP3A4 (0.61) | MEN1KMT2AALDH1A1SMN1; SMN2CYP3A4 | |
| SCHEMBL632457 | 0.78 | BACE1 (0.47) | MEN1KMT2ABACE1ALDH1A1CYP3A4 | |
| SCHEMBL1400225 | 0.78 | CASP7 (0.47) | MEN1KMT2AESR2ALDH1A1CYP3A4 | |
| SCHEMBL27510157 | 0.72 | NR4A1 (0.56) | MEN1KMT2AESR1ESR2HSP90AA1 | |
| SCHEMBL6425437 | 0.72 | F2 (0.45) | MEN1KMT2AESR1ESR2HSP90AA1 | |
| SCHEMBL5032127 | 0.71 | HSP90AA1 (0.58) | MEN1KMT2AESR1ESR2HSP90AA1 | |
| SCHEMBL11798878 | 0.71 | CASP1 (0.43) | MEN1KMT2AESR2ALDH1A1CYP3A4 | |
| SCHEMBL3126597 | 0.71 | ALOX15 (0.48) | MEN1KMT2AESR1HSP90AA1ALDH1A1 | |
| SCHEMBL10521152 | 0.71 | CYP3A4 (0.67) | MEN1KMT2AESR1ESR2HSP90AA1 | |
| SCHEMBL436522 | 0.70 | NR4A1 (0.61) | MEN1KMT2AESR1ESR2HSP90AA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9975996-B2 | Positive photosensitive resin composition and polyhydroxyamide resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-05-22 | — | — | US | claimed |
| US-20160185905-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND POLYHYDROXYAMIDE RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-06-30 | — | — | US | claimed |
| US-6875554-B2 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-04-05 | — | — | US | claimed |
| CN-119585651-A | Composition for forming wavelength conversion film | 日产化学株式会社 | 2025-03-07 | — | — | CN | disclosed |
| WO-2025047700-A1 | COMPOSITION FOR FORMING WAVELENGTH CONVERSION FILM AND USE THEREOF | 日産化学株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2025047702-A1 | COMPOSITION FOR PATTERNING AND USE OF SAME | 日産化学株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2024214539-A1 | COMPOSITION FOR FORMING WAVELENGTH CONVERSION FILM, AND COMPOUND | 日産化学株式会社 | 2024-10-17 | — | — | WO | disclosed |
| CN-118525024-A | Condensed ring thiophene compound and composition for forming wavelength conversion film containing same | 国立大学法人东海国立大学机构 | 2024-08-20 | — | — | CN | disclosed |
| CN-118318191-A | Composition for forming wavelength conversion film | 日产化学株式会社 | 2024-07-09 | — | — | CN | disclosed |
| CN-118192168-A | Photosensitive resin composition | 日产化学株式会社 | 2024-06-14 | — | — | CN | disclosed |
| WO-2024122572-A1 | WAVELENGTH CONVERSION FILM-FORMING COMPOSITION AND FUSED THIOPHENE COMPOUND | 日産化学株式会社 | 2024-06-13 | — | — | WO | disclosed |
| US-20040197699-A1 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-10-07 | — | — | US | disclosed |
| EP-1431822-A1 | POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2004-06-23 | — | — | EP | disclosed |
| US-20040048188-A1 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-03-11 | — | — | US | disclosed |
| US-6677099-B1 | POLYAMIDEIMIDE DEVELOPED BY AN AQUEOUS ALKALINE SOLUTION AND WHICH IS EXCELLENT IN THE DEVELOPABILITY AND THE ADHESION TO A SUBSTRATE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-01-13 | — | — | US | disclosed |
| EP-1329769-A1 | POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2003-07-23 | — | — | EP | disclosed |
| EP-1241527-A1 | POSITIVE TYPE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2002-09-18 | — | — | EP | disclosed |
| EP-0424940-B1 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL IND LTD (JP) | 1998-01-14 | — | — | EP | disclosed |
| US-5288588-A | Containing diamine substituted with phenolic hydroxyl, carboxyl, thiophenol and/or sulfonic groups | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1994-02-22 | — | — | US | disclosed |
| EP-0424940-A2 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 1991-05-02 | — | — | EP | disclosed |