SCHEMBL15769065

SCHEMBL15769065

C=C(C)C(=O)OC12CC3CC(C1)CC(C(=O)OC(C(F)(F)F)C(F)(F)S(=O)(=O)[O-])(C3)C2.C[N+](C)(C)Cc1ccccc1

nearest known ligand 0.32

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.32
TP53 P04637 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.31
MGLL Q99685 1/20 0.30
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1318815 0.88 L3MBTL1 (0.30) L3MBTL1
SCHEMBL16820467 0.86 MGLL (0.30) MGLL
SCHEMBL668332 0.85 RECQL (0.37) ALDH1A1MGLLLMNA
SCHEMBL8512302 0.84
SCHEMBL18430000 0.83 ALDH1A1 (0.32) ALDH1A1TP53L3MBTL1
SCHEMBL6117737 0.82 KDM4E (0.36) ALDH1A1MGLL
SCHEMBL11964322 0.80
SCHEMBL17525031 0.80
SCHEMBL8510093 0.79
SCHEMBL668333 0.78 ALDH1A1 (0.40) ALDH1A1MGLLLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2947126-B1 CONDUCTIVE POLYMER COMPOSITE AND SUBSTRATE SHINETSU CHEMICAL CO (JP) 2019-02-13 EP disclosed
US-9657115-B2 Polymer compound for a conductive polymer and method for manufacturing same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-23 US disclosed
US-9587137-B2 Conductive polymer composite comprising a sulfo group-containing dopant polymer and substrate SHI-ETSU CHEMICAL CO., LTD. (JP) 2017-03-07 US disclosed
US-9493597-B2 Polymer compound having a specific super strongly acidic sulfo group SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-11-15 US disclosed
US-20150340118-A1 CONDUCTIVE POLYMER COMPOSITE AND SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-26 US disclosed
EP-2947126-A1 CONDUCTIVE POLYMER COMPOSITE AND SUBSTRATE Shin-Etsu Chemical Co., Ltd. (JP) 2015-11-25 EP disclosed
US-9146464-B2 Sulfonium salt, polymer, polymer making method, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-09-29 US disclosed
US-9091918-B2 Sulfonium salt, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-28 US disclosed
US-20150175730-A1 POLYMER COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-25 US disclosed
US-20150175722-A1 POLYMER COMPOUND FOR A CONDUCTIVE POLYMER AND METHOD FOR MANUFACTURING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-25 US disclosed
US-20140272707-A1 SULFONIUM SALT, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed
US-20140162189-A1 SULFONIUM SALT, POLYMER, POLYMER MAKING METHOD, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-12 US disclosed