Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RECQL | P46063 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | CYP17A1 | P05093 | 5/20 | 0.36 |
| ▸ | CYP19A1 | P11511 | 5/20 | 0.36 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | MGLL | Q99685 | 1/20 | 0.34 |
| ▸ | GABBR2 | O75899 | 1/20 | 0.34 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.34 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.34 |
| ▸ | GABBR1 | Q9UBS5 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL668333 | 0.92 | ALDH1A1 (0.40) | RECQLALDH1A1GAASMN1; SMN2HPGD | |
| SCHEMBL16820467 | 0.86 | MGLL (0.30) | MGLL | |
| SCHEMBL16820422 | 0.86 | — | — | |
| SCHEMBL15769065 | 0.85 | ALDH1A1 (0.32) | ALDH1A1LMNAMGLL | |
| SCHEMBL501575 | 0.83 | KDM4E (0.38) | RECQLALDH1A1GAASMN1; SMN2CYP17A1 | |
| SCHEMBL18762056 | 0.81 | PRKCA (0.40) | ALDH1A1GAASMN1; SMN2CYP17A1CYP19A1 | |
| SCHEMBL18762052 | 0.81 | PRKCA (0.40) | ALDH1A1GAACYP17A1CYP19A1KDM4E | |
| SCHEMBL668248 | 0.81 | PRKCA (0.40) | ALDH1A1GAACYP17A1CYP19A1KDM4E | |
| SCHEMBL18762054 | 0.81 | PRKCA (0.40) | ALDH1A1GAACYP17A1CYP19A1KDM4E | |
| SCHEMBL6117737 | 0.80 | KDM4E (0.36) | ALDH1A1KDM4EMGLL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11448962-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-09-20 | — | — | US | disclosed |
| CN-111522198-A | Resist composition and pattern forming method | 信越化学工业株式会社 | 2020-08-11 | — | — | CN | disclosed |
| US-20200249571-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-08-06 | — | — | US | disclosed |
| US-10078264-B2 | Resist composition, patterning process, and barium, cesium and cerium salts | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-09-18 | — | — | US | disclosed |
| US-20170115566-A1 | RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-27 | — | — | US | disclosed |
| US-20160334706-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-17 | — | — | US | disclosed |
| US-8597869-B2 | Sulfonium salt, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-12-03 | — | — | US | disclosed |
| US-8535869-B2 | Sulfonium salt, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-09-17 | — | — | US | disclosed |
| US-20120100486-A1 | SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20120045724-A1 | SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-02-23 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170115566-A1 | RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS | CASR, LIFR, LBR | RECQL 2526/4885ALDH1A1 4520/4885GAA 1776/4885 |
| US-20200249571-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | PAG1, LIFR, GIGYF2 | RECQL 2714/4885ALDH1A1 1477/4885GAA 1850/4885 |
| US-20120100486-A1 | SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS | STS, SLC6A5, SLC6A9 | RECQL 4491/4885ALDH1A1 3978/4885GAA 3046/4885 |
| US-10078264-B2 | Resist composition, patterning process, and barium, cesium and cerium salts | CASR, LIFR, LBR | RECQL 2526/4885ALDH1A1 4520/4885GAA 1776/4885 |
| US-11448962-B2 | Resist composition and patterning process | PAG1, LIFR, GIGYF2 | RECQL 2714/4885ALDH1A1 1477/4885GAA 1850/4885 |
| US-20120045724-A1 | SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS | SLC6A5, NES, STS | RECQL 4427/4885ALDH1A1 3412/4885GAA 2026/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.