SCHEMBL15823752

SCHEMBL15823752

C1=NC(Cc2ccccc2)CO1

nearest known ligand 0.50

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 4/20 0.50
MAPT P10636 2/20 0.43
NPC1 O15118 1/20 0.43
POLB P06746 1/20 0.43
RAB9A P51151 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
NOS3 P29474 1/20 0.41
NOS1 P29475 1/20 0.41
NOS2 P35228 1/20 0.41
GBA1 P04062 1/20 0.36
ALDH1A1 P00352 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3128078 1.00 TAAR1 (0.50) TAAR1MAPTNPC1POLBRAB9A
Butane SCHEMBL29218360 0.93 TAAR1 (0.45) TAAR1MAPTNPC1POLBRAB9A
SCHEMBL21056496 0.90 TAAR1 (0.38) TAAR1MAPTNPC1POLBRAB9A
SCHEMBL21056505 0.87 TAAR1 (0.38) TAAR1MAPTNPC1POLBRAB9A
SCHEMBL21056498 0.84 TAAR1 (0.40) TAAR1
SCHEMBL15843200 0.77 TAAR1 (0.55) TAAR1MAPTNPC1POLBRAB9A
SCHEMBL15842751 0.74 TAAR1 (0.41) TAAR1MAPTNPC1POLBRAB9A
SCHEMBL1983682 0.69 MAPT (0.71) TAAR1MAPTNPC1POLBRAB9A
SCHEMBL12786229 0.69 MAPT (0.71) TAAR1MAPTNPC1POLBRAB9A
SCHEMBL28654226 0.68 NOS3 (0.47) TAAR1MAPTNPC1POLBRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 210 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114605458-A Method for preparing chiral gamma-amino boric acid ester by activating carbon-carbon bond of cyclopropane under catalysis of transition metal 上海毕得医药科技股份有限公司 2022-06-10 CN claimed
CN-104193645-B Preparation method of chiral dimethyl cyclopropyl carboxamide 上海应用技术学院 2017-02-01 CN claimed
CN-104193645-A Preparation method of chiral dimethyl cyclopropyl carboxamide SHANGHAI INST TECHNOLOGY 2014-12-10 CN claimed
CN-100448489-C Flame-retardant polyester artificial hair KANEGAFUCHI CHEMICAL IND (JP) 2009-01-07 CN claimed
US-20260144018-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-05-21 US disclosed
US-12588474-B2 Composition for forming protective film against alkaline aqueous hydrogen peroxide, substrate for producing semiconductor apparatus, method for forming protective film, and method for forming pattern SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-03-24 US disclosed
US-12584023-B2 Composition for forming organic film, patterning process, and compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-03-24 US disclosed
EP-4239408-B1 COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND SHINETSU CHEMICAL CO (JP) 2025-12-10 EP disclosed
CN-118666740-A Synthesis of surface chiral [2.2] cyclopyridine/lactam compound by parallel kinetic resolution and preparation method thereof 贵州大学 2024-09-20 CN disclosed
EP-4276535-B1 COMPOSITION FOR FORMING METAL OXIDE FILM, PATTERNING PROCESS, AND METHOD FOR FORMING METAL OXIDE FILM SHINETSU CHEMICAL CO (JP) 2024-09-18 EP disclosed
CN-118652278-A Chiral silicon spiro phosphine-oxazoline ligand, ionic iridium complex, preparation method and application thereof 复旦大学 2024-09-17 CN disclosed
CN-118330991-A Composition for forming resist underlayer film, pattern forming method, and method for forming resist underlayer film 信越化学工业株式会社 2024-07-12 CN disclosed
CN-101300245-A Process for producing 6, 6-dimethyl-3-oxabicyclo [3.1.0] hexan-2-one SUMITOMO CHEMICAL CO (JP) 2008-11-05 CN disclosed
CN-101280101-A Aromatic panlite compound TEIJIN CHEMICALS LTD (JP) 2008-10-08 CN disclosed
CN-100396720-C Aliphatic polyester resin composition, method for production thereof, molded article and foamed article comprising the resin composition UNITIKA LTD (JP) 2008-06-25 CN disclosed
CN-1805999-A Aliphatic polyester resin composition, method for production thereof, molded article and foamed article comprising the resin composition UNITIKA LTD (JP) 2006-07-19 CN disclosed
CN-1599776-A Flame-retardant resin composition POLYPLASTICS CO (JP) 2005-03-23 CN disclosed
CN-1193120-C Polyester fiber TEIJIN LTD (JP) 2005-03-16 CN disclosed
CN-1564848-A Resin composition and molding, film and fiber each comprising the same TORAY INDUSTRIES (JP) 2005-01-12 CN disclosed
CN-1441863-A Polyester fiber TEIJIN LTD (JP) 2003-09-10 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12584023-B2 Composition for forming organic film, patterning process, and compound F12, MLX, F11 TAAR1 2716/4885MAPT 1384/4885NPC1 455/4885
US-12588474-B2 Composition for forming protective film against alkaline aqueous hydrogen peroxide, substrate for producing semiconductor apparatus, method for forming protective film, and method for forming pattern RAD51, HAO2, GPX1 TAAR1 1919/4885MAPT 3682/4885NPC1 3796/4885
US-20260144018-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN RAD51, HAO2, ASIC1 TAAR1 1990/4885MAPT 2530/4885NPC1 3803/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.