Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | ADAM17 | P78536 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | TRPM8 | Q7Z2W7 | 2/20 | 0.32 |
| ▸ | S1PR3 | Q99500 | 2/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8738164 | 0.72 | HSD11B1 (0.46) | HSD11B1LMNAALOX15S1PR3S1PR1 | |
| SCHEMBL138266 | 0.70 | GAA (0.39) | HSD11B1KDM4EMEN1LMNAALOX15 | |
| SCHEMBL24292459 | 0.69 | BTK (0.38) | HSD11B1TRPM8S1PR3GAA | |
| SCHEMBL879530 | 0.67 | TSHR (0.36) | HSD11B1KDM4EMEN1LMNAALOX15 | |
| SCHEMBL1852429 | 0.65 | ADH1C (0.38) | HSD11B1MEN1LMNAKMT2AS1PR3 | |
| SCHEMBL13979759 | 0.65 | NPSR1 (0.47) | KDM4EMEN1LMNAKMT2AGAA | |
| SCHEMBL24292449 | 0.64 | HSD11B1 (0.37) | HSD11B1TRPM8S1PR3GAA | |
| SCHEMBL8736905 | 0.64 | ADH1A (0.39) | MEN1KMT2ATRPM8S1PR3S1PR1 | |
| SCHEMBL24292458 | 0.64 | ADH1C (0.35) | HSD11B1MEN1KMT2AS1PR3S1PR1 | |
| SCHEMBL18639678 | 0.63 | CES2 (0.31) | LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2014104400-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2014-07-03 | — | — | WO | disclosed |