SCHEMBL15869167

SCHEMBL15869167

CC(C)(C)Oc1ccc(C2CCC(c3ccc(OC(C)(C)C)cc3)(c3ccc(OC(C)(C)C)cc3)CC2)cc1

nearest known ligand 0.43

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ SLC6A4 P31645 7/20 0.43
▸ SLC6A3 Q01959 5/20 0.43
▸ SLC6A2 P23975 2/20 0.43
▸ ADORA3 P0DMS8 1/20 0.40
▸ ESR2 Q92731 4/20 0.37
▸ LMNA P02545 2/20 0.33
▸ CYP2C9 P11712 1/20 0.33
▸ TSHR P16473 1/20 0.33
▸ BLM P54132 1/20 0.33
▸ PPARA Q07869 1/20 0.33
▸ PDE2A O00408 2/20 0.33
▸ DRD2 P14416 1/20 0.32
▸ ESR1 P03372 1/20 0.32
▸ GPR174 Q9BXC1 1/20 0.32
▸ ABL1 P00519 1/20 0.32
▸ MAPK1 P28482 1/20 0.31
▸ MAPK14 Q16539 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15869179 0.85 ADORA3 (0.45) SLC6A4SLC6A3SLC6A2ADORA3ESR2
SCHEMBL3688441 0.82 ESR2 (0.41) SLC6A4SLC6A3SLC6A2ESR2LMNA
SCHEMBL15869205 0.82 SLC6A4 (0.44) SLC6A4SLC6A3SLC6A2ADORA3PDE2A
SCHEMBL15869212 0.79 SLC6A4 (0.58) SLC6A4SLC6A3SLC6A2ADORA3ESR2
SCHEMBL12929954 0.78 HRH3 (0.44) SLC6A4SLC6A3SLC6A2LMNACYP2C9
SCHEMBL15869211 0.78 SLC6A4 (0.61) SLC6A4SLC6A3SLC6A2ADORA3ESR2
SCHEMBL20390048 0.75 CYP2C9 (0.41) SLC6A4SLC6A3SLC6A2ESR2LMNA
SCHEMBL31476801 0.75 HTR2C (0.51) SLC6A4SLC6A3SLC6A2
SCHEMBL3812366 0.74 ESR2 (0.44) ESR2CYP2C9ESR1
SCHEMBL23594005 0.72 DRD2 (0.42) SLC6A4CYP2C9DRD2MAPK14

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 — — US disclosed
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 — — US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 — — US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 — — US disclosed
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