SCHEMBL15869192

SCHEMBL15869192

CCOC(C)Oc1ccc(C2CCC(c3ccc(OC(C)OCC)cc3)(c3ccc(OC(C)OCC)cc3)CC2)cc1

nearest known ligand 0.33

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
▸ DRD2 P14416 1/20 0.33
▸ TSHR P16473 1/20 0.33
▸ MEN1 O00255 1/20 0.32
▸ KMT2A Q03164 1/20 0.32
▸ ESR2 Q92731 2/20 0.32
▸ POLB P06746 1/20 0.32
▸ SLC6A2 P23975 1/20 0.32
▸ SLC6A4 P31645 1/20 0.32
▸ SLC6A3 Q01959 1/20 0.32
▸ ADORA3 P0DMS8 1/20 0.30
▸ IDO1 P14902 1/20 0.30
▸ FFAR1 O14842 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15869202 0.83 ADORA3 (0.43) TSHRMEN1KMT2AESR2SLC6A2
SCHEMBL15869181 0.83 ADORA3 (0.34) ADORA3
SCHEMBL15869191 0.81 ADORA3 (0.45) ESR2SLC6A2SLC6A4SLC6A3ADORA3
SCHEMBL13845274 0.77 CYP2C9 (0.48) DRD2TSHRMEN1KMT2AESR2
SCHEMBL13845278 0.74 IDO1 (0.33) DRD2TSHRPOLBSLC6A2SLC6A4
SCHEMBL13845280 0.74 CYP2C9 (0.39) DRD2MEN1KMT2AESR2
SCHEMBL3852488 0.73 LMNA (0.52) TSHRKMT2APOLB
SCHEMBL15869179 0.72 ADORA3 (0.45) DRD2TSHRESR2SLC6A2SLC6A4
SCHEMBL15869167 0.71 SLC6A4 (0.43) DRD2TSHRESR2SLC6A2SLC6A4
SCHEMBL9320720 0.69 MMP1 (0.35) MEN1KMT2ASLC6A4ADORA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 — — US disclosed
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 — — US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 — — US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 — — US disclosed
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