SCHEMBL15907712

SCHEMBL15907712

C=Cc1ccc(COC(=O)C(C)O)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TAS1R3 Q7RTX0 2/20 0.43
TAS1R1 Q7RTX1 2/20 0.43
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
ALDH1A1 P00352 2/20 0.38
AAK1 Q2M2I8 1/20 0.38
TP53 P04637 1/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA12 O43570 1/20 0.36
AKR1B10 O60218 1/20 0.36
AKR1B1 P15121 1/20 0.36
CA4 P22748 1/20 0.36
CA6 P23280 1/20 0.36
CA5A P35218 1/20 0.36
CA7 P43166 1/20 0.36
CA9 Q16790 1/20 0.36
CA14 Q9ULX7 1/20 0.36
CA5B Q9Y2D0 1/20 0.36
MIF P14174 3/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18874550 0.87 TAS1R3 (0.45) TAS1R3TAS1R1MEN1KMT2AALDH1A1
SCHEMBL21534581 0.87 TAS1R3 (0.42) TAS1R3TAS1R1MEN1KMT2AALDH1A1
SCHEMBL10033556 0.85 TAS1R3 (0.41) TAS1R3TAS1R1MEN1KMT2AALDH1A1
SCHEMBL15292568 0.83 MEN1 (0.41) TAS1R3TAS1R1MEN1KMT2AALDH1A1
SCHEMBL1051823 0.82 ALDH1A1 (0.58) TAS1R3TAS1R1MEN1KMT2AALDH1A1
SCHEMBL16022460 0.81 LTA4H (0.40) TAS1R3TAS1R1MEN1KMT2AALDH1A1
SCHEMBL12747533 0.81 TAS1R3 (0.40) TAS1R3TAS1R1MEN1KMT2AALDH1A1
SCHEMBL15292563 0.81 TAS1R3 (0.48) TAS1R3TAS1R1MEN1KMT2AALDH1A1
SCHEMBL14944204 0.80 AKR1B10 (0.42) TAS1R3TAS1R1MEN1KMT2AALDH1A1
SCHEMBL15958348 0.80 MEN1 (0.37) TAS1R3TAS1R1MEN1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9846360-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-12-19 US disclosed
US-9760010-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-09-12 US disclosed
US-20170003590-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-01-05 US disclosed
US-20160363866-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-12-15 US disclosed
US-9023587-B2 Negative resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-05-05 US disclosed
US-20140212810-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-31 US disclosed