Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TGM2 | P21980 | 2/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 3/20 | 0.31 |
| ▸ | NPC1 | O15118 | 2/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | PPARG | P37231 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | F13A1 | P00488 | 1/20 | 0.30 |
| ▸ | TGM1 | P22735 | 1/20 | 0.30 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
| ▸ | TACR1 | P25103 | 1/20 | 0.30 |
| ▸ | MAOB | P27338 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18360619 | 0.81 | ADRB2 (0.34) | TGM2CYP3A4RAB9ANPC1SMN1; SMN2 | |
| SCHEMBL19335426 | 0.79 | — | — | |
| SCHEMBL16687327 | 0.78 | POLB (0.35) | TGM2CYP3A4PPARGMEN1KMT2A | |
| SCHEMBL61037 | 0.76 | ALDH1A1 (0.50) | CYP3A4RAB9ASMN1; SMN2LMNAMAPT | |
| SCHEMBL2029842 | 0.76 | THRB (0.46) | CYP3A4SMN1; SMN2LMNAPPARGTSHR | |
| SCHEMBL18309861 | 0.76 | PDK1 (0.37) | MEN1KMT2APOLBMAPK1MAOB | |
| SCHEMBL28106174 | 0.76 | ALDH1A1 (0.41) | CYP3A4RAB9ANPC1MAPTKMT2A | |
| SCHEMBL31670202 | 0.74 | ALDH1A1 (0.52) | SMN1; SMN2LMNAMEN1KMT2AMAPK1 | |
| SCHEMBL20830529 | 0.74 | ALDH1A1 (0.52) | SMN1; SMN2LMNAMEN1KMT2AMAPK1 | |
| SCHEMBL9344820 | 0.74 | L3MBTL1 (0.38) | TGM2MAPTHTTTSHRL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9846360-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-9760010-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9760010-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| US-20170003590-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-05 | — | — | US | disclosed |
| US-20160363866-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-15 | — | — | US | disclosed |
| US-20160363866-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-15 | — | — | US | disclosed |
| US-9023587-B2 | Negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-05-05 | — | — | US | disclosed |
| US-9023587-B2 | Negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-05-05 | — | — | US | disclosed |
| US-20140212810-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-31 | — | — | US | disclosed |