SCHEMBL15915541

SCHEMBL15915541

CC(C)[Si](O[Si](c1ccccc1)(c1ccccc1)C(C)C)(c1ccccc1)c1ccccc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 3/20 0.35
ESR1 P03372 1/20 0.34
ESR2 Q92731 1/20 0.34
KCNH3 Q9ULD8 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
L3MBTL1 Q9Y468 2/20 0.32
ALDH1A1 P00352 1/20 0.32
LMNA P02545 1/20 0.32
CA4 P22748 1/20 0.32
KDM4E B2RXH2 1/20 0.31
MEN1 O00255 1/20 0.31
MAPT P10636 1/20 0.31
TSHR P16473 1/20 0.31
KMT2A Q03164 1/20 0.31
ATM Q13315 1/20 0.31
TAAR1 Q96RJ0 4/20 0.31
SLC6A2 P23975 2/20 0.31
MAOA P21397 1/20 0.31
SLC6A4 P31645 1/20 0.31
SLC6A3 Q01959 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL703676 0.85 POLB (0.35) POLBESR1ESR2KCNH3TDP1
SCHEMBL706226 0.83 ALDH1A1 (0.33) POLBESR1ESR2KCNH3TDP1
SCHEMBL8386211 0.83 ESR1 (0.31) POLBESR1ESR2KCNH3TDP1
SCHEMBL704336 0.81 CA4 (0.37) POLBESR1ESR2LMNACA4
SCHEMBL705549 0.80 MAPK1 (0.37) ALDH1A1
SCHEMBL15914882 0.80 LMNA (0.34) LMNAMEN1TSHRKMT2ATAAR1
SCHEMBL703386 0.80 PRNP (0.33) POLBL3MBTL1ALDH1A1LMNAKDM4E
SCHEMBL2744868 0.79 ESR1 (0.34) POLBESR1ESR2TDP1L3MBTL1
SCHEMBL705565 0.77 MTNR1A (0.38) ESR1TDP1ALDH1A1KDM4EMAPT
SCHEMBL703696 0.77 ALDH1A1 (0.37) ALDH1A1LMNAKDM4EMEN1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9970103-B2 Film deposition material, sealing film using the same and use thereof TOSOH CORPORATION (JP) 2018-05-15 US disclosed
CN-103781937-B Filmogen, the diaphragm seal using the filmogen, and application thereof 东曹株式会社 2017-05-31 CN disclosed
US-20160326642-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2016-11-10 US disclosed
US-20140219903-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2014-08-07 US disclosed