SCHEMBL15960964

SCHEMBL15960964

Cc1ccc(Nc2ccc(C(C)c3cccc4ccccc34)c3ccccc23)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 2/20 0.45
CDC25B P30305 2/20 0.45
ALDH1A1 P00352 1/20 0.45
TP53 P04637 1/20 0.45
CYP3A4 P08684 1/20 0.45
ALOX15 P16050 1/20 0.45
TSHR P16473 1/20 0.45
ATM Q13315 1/20 0.45
HSD17B10 Q99714 1/20 0.45
RAB9A P51151 4/20 0.44
KMT2A Q03164 3/20 0.42
MEN1 O00255 2/20 0.41
GAA P10253 2/20 0.41
MAPT P10636 2/20 0.41
TDP1 Q9NUW8 2/20 0.41
KDM4E B2RXH2 1/20 0.41
GLA P06280 1/20 0.41
RECQL P46063 1/20 0.41
KDM1A O60341 1/20 0.40
NPC1 O15118 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15960961 0.87 RAB9A (0.38) HPGDCDC25BALDH1A1TP53CYP3A4
SCHEMBL15960968 0.84 CDC25B (0.42) HPGDCDC25BALDH1A1TP53CYP3A4
SCHEMBL15960969 0.83 HPGD (0.44) HPGDCDC25BALDH1A1TP53CYP3A4
SCHEMBL15960966 0.81 HPGD (0.46) HPGDCDC25BALDH1A1RAB9AKMT2A
SCHEMBL30575369 0.78 CDC25B (0.71) HPGDCDC25BALDH1A1TP53CYP3A4
SCHEMBL1009448 0.78 CDC25B (0.71) HPGDCDC25BALDH1A1TP53CYP3A4
SCHEMBL15960959 0.78 FLT1 (0.44) HPGDALDH1A1TP53RAB9AKMT2A
SCHEMBL15960960 0.78 MMP2 (0.40) HPGDTP53RAB9AKMT2AMEN1
SCHEMBL11618839 0.78 HPGD (0.57) HPGDCDC25BALDH1A1TP53CYP3A4
SCHEMBL15960963 0.76 GAA (0.36) HPGDCDC25BTP53TSHRRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230333474-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING FLUOROALKYL GROUP-CONTAINING ORGANIC ACID OR SALT THEREOF NISSAN CHEMICAL CORPORATION (JP) 2023-10-19 US disclosed
US-9263286-B2 Diarylamine novolac resin NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-02-16 US disclosed
US-20140235059-A1 DIARYLAMINE NOVOLAC RESIN NISSAN CHEMICAL INDUSTRIES, LTD (JP) 2014-08-21 US disclosed