SCHEMBL15960969

SCHEMBL15960969

Cc1ccc(Nc2ccc(C(C)c3ccccc3)c3ccccc23)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 2/20 0.44
NPC1 O15118 1/20 0.44
RAB9A P51151 1/20 0.44
MAPT P10636 3/20 0.43
GAA P10253 2/20 0.43
TDP1 Q9NUW8 2/20 0.43
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
KDM4E B2RXH2 1/20 0.43
GLA P06280 1/20 0.43
RECQL P46063 1/20 0.43
KDM1A O60341 1/20 0.42
KCNH3 Q9ULD8 1/20 0.38
NPY5R Q15761 1/20 0.38
CDC25B P30305 3/20 0.37
TP53 P04637 2/20 0.37
LMNA P02545 1/20 0.37
ABCG2 Q9UNQ0 1/20 0.37
UBE2I P63279 1/20 0.37
SAE1 Q9UBE0 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15960960 0.92 MMP2 (0.40) HPGDNPC1RAB9AMAPTGAA
SCHEMBL15960959 0.89 FLT1 (0.44) HPGDNPC1RAB9AMAPTGAA
SCHEMBL15960962 0.87 RAB9A (0.50) HPGDNPC1RAB9AMAPTGAA
SCHEMBL15960971 0.86 CYP2A6 (0.39) HPGDNPC1RAB9AMAPTGAA
SCHEMBL15960963 0.84 GAA (0.36) HPGDNPC1RAB9AMAPTGAA
SCHEMBL15960964 0.83 HPGD (0.45) HPGDNPC1RAB9AMAPTGAA
SCHEMBL15960968 0.81 CDC25B (0.42) HPGDNPC1RAB9AMAPTGAA
SCHEMBL21165374 0.81 HPGD (0.46) HPGDNPC1RAB9AMAPTGAA
SCHEMBL15960961 0.79 RAB9A (0.38) HPGDNPC1RAB9AMAPTGAA
SCHEMBL10781589 0.77 HPGD (0.68) HPGDNPC1RAB9AMAPTGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230333474-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING FLUOROALKYL GROUP-CONTAINING ORGANIC ACID OR SALT THEREOF NISSAN CHEMICAL CORPORATION (JP) 2023-10-19 US disclosed
US-9958781-B2 Method for film formation, and pattern-forming method JSR CORPORATION (JP) 2018-05-01 US disclosed
US-20180046081-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM-FORMING PROCESS, AND PRODUCTION METHOD OF PATTERNED SUBSTRATE JSR CORPORATION (JP) 2018-02-15 US disclosed
US-20160314984-A1 METHOD FOR FILM FORMATION, AND PATTERN-FORMING METHOD JSR CORPORATION (JP) 2016-10-27 US disclosed
US-9263286-B2 Diarylamine novolac resin NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-02-16 US disclosed
US-20140235059-A1 DIARYLAMINE NOVOLAC RESIN NISSAN CHEMICAL INDUSTRIES, LTD (JP) 2014-08-21 US disclosed