SCHEMBL15960968

SCHEMBL15960968

Cc1ccc(Nc2ccc(C(C)c3c4ccccc4cc4ccccc34)c3ccccc23)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CDC25B P30305 2/20 0.42
UBE2I P63279 1/20 0.42
SAE1 Q9UBE0 1/20 0.42
UBA2 Q9UBT2 1/20 0.42
KMT2A Q03164 5/20 0.39
MEN1 O00255 3/20 0.39
KDM1A O60341 1/20 0.38
MAPT P10636 5/20 0.38
GAA P10253 4/20 0.38
TDP1 Q9NUW8 4/20 0.38
RAB9A P51151 3/20 0.37
NPC1 O15118 1/20 0.37
HPGD P15428 2/20 0.37
L3MBTL1 Q9Y468 3/20 0.36
RECQL P46063 3/20 0.36
ALDH1A1 P00352 2/20 0.36
TP53 P04637 2/20 0.36
POLB P06746 2/20 0.36
CYP3A4 P08684 1/20 0.36
ALOX15 P16050 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15960964 0.84 HPGD (0.45) CDC25BUBE2ISAE1UBA2KMT2A
SCHEMBL15960969 0.81 HPGD (0.44) CDC25BUBE2ISAE1UBA2KMT2A
SCHEMBL15960961 0.80 RAB9A (0.38) CDC25BUBE2ISAE1UBA2KMT2A
SCHEMBL15960960 0.76 MMP2 (0.40) KMT2AMEN1KDM1AMAPTGAA
SCHEMBL15960959 0.76 FLT1 (0.44) KMT2AMEN1KDM1AMAPTGAA
SCHEMBL15960963 0.74 GAA (0.36) CDC25BKMT2AMEN1KDM1AMAPT
SCHEMBL15960962 0.74 RAB9A (0.50) KMT2AMEN1KDM1AMAPTGAA
SCHEMBL5626236 0.74 KMT2A (0.53) CDC25BUBE2ISAE1UBA2KMT2A
SCHEMBL15960971 0.73 CYP2A6 (0.39) CDC25BUBE2ISAE1UBA2KMT2A
SCHEMBL21165374 0.73 HPGD (0.46) CDC25BUBE2ISAE1UBA2KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230333474-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING FLUOROALKYL GROUP-CONTAINING ORGANIC ACID OR SALT THEREOF NISSAN CHEMICAL CORPORATION (JP) 2023-10-19 US disclosed
US-9263286-B2 Diarylamine novolac resin NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-02-16 US disclosed
US-20140235059-A1 DIARYLAMINE NOVOLAC RESIN NISSAN CHEMICAL INDUSTRIES, LTD (JP) 2014-08-21 US disclosed