⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL867462 | 0.90 | TSHR (0.39) | — | |
| SCHEMBL868041 | 0.88 | TSHR (0.34) | — | |
| SCHEMBL868633 | 0.88 | TSHR (0.34) | — | |
| SCHEMBL868123 | 0.75 | — | — | |
| SCHEMBL2367994 | 0.72 | — | — | |
| SCHEMBL632195 | 0.72 | — | — | |
| SCHEMBL20526212 | 0.72 | MMP9 (0.30) | — | |
| SCHEMBL2367586 | 0.71 | — | — | |
| SCHEMBL35383 | 0.70 | MMP9 (0.33) | — | |
| SCHEMBL2368023 | 0.68 | SORT1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2158277-B1 | AQUEOUS COMPOSITION COMPRISING LACTAM FOR COATING OVER A PHOTORESIST PATTERN | AZ ELECTRONIC MATERIALS USA (US) | 2014-03-05 | — | — | EP | disclosed |
| US-20120219919-A1 | Composition for Coating over a Photoresist Pattern Comprising a Lactam | THIYAGARAJAN MUTHIAH (US) | 2012-08-30 | — | — | US | disclosed |
| EP-2389612-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ Electronic Materials USA Corp. (US) | 2011-11-30 | — | — | EP | disclosed |
| US-7923200-B2 | Polyvinylcaprolactam based; for production of microelectronics | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2011-04-12 | — | — | US | disclosed |
| WO-2010084372-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-07-29 | — | — | WO | disclosed |
| US-20100183851-A1 | Photoresist Image-forming Process Using Double Patterning | CAO YI | 2010-07-22 | — | — | US | disclosed |
| EP-2158277-A2 | A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN COMPRISING A LACTEM | AZ Electronic Materials USA Corp. (US) | 2010-03-03 | — | — | EP | disclosed |
| WO-2008122884-A2 | A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN COMPRISING A LACTEM | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-10-16 | — | — | WO | disclosed |
| US-20080248427-A1 | Composition for Coating over a Photoresist Pattern Comprising a Lactam | MERCK PATENT GMBH (DE) | 2008-10-09 | — | — | US | disclosed |