Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8577930 | 0.86 | SMN1; SMN2 (0.33) | LMNAMTNR1ANPC1HPGDKMT2A | |
| SCHEMBL13115813 | 0.86 | SMN1; SMN2 (0.33) | LMNAMTNR1ANPC1HPGDKMT2A | |
| SCHEMBL20217112 | 0.84 | MTNR1A (0.33) | MTNR1A | |
| SCHEMBL29083340 | 0.79 | SMN1; SMN2 (0.33) | LMNAMTNR1ANPC1HPGDKMT2A | |
| SCHEMBL27274527 | 0.79 | MTNR1A (0.31) | MTNR1A | |
| SCHEMBL11425576 | 0.78 | ALDH1A1 (0.35) | LMNAKMT2ASMN1; SMN2 | |
| Methane SCHEMBL28524803 | 0.78 | USP2 (0.32) | MTNR1AHPGDKMT2ASMN1; SMN2 | |
| SCHEMBL21095245 | 0.77 | ALOX5 (0.45) | LMNAHPGD | |
| SCHEMBL15827370 | 0.75 | LMNA (0.35) | LMNA | |
| SCHEMBL467319 | 0.73 | HTT (0.32) | LMNAMTNR1AHPGDKMT2ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2016027735-A1 | METHOD FOR PRODUCING EPOXY COMPOUND CONTAINING HYDROGEN PEROXIDE STABILIZER | 日産化学工業株式会社 | 2016-02-25 | — | — | WO | disclosed |
| EP-2813890-A2 | Photoresist underlayer film-forming composition and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2014-12-17 | — | — | EP | disclosed |