Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | GPR3 | P46089 | 1/20 | 0.36 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.36 |
| ▸ | CES1 | P23141 | 2/20 | 0.34 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.33 |
| ▸ | CA1 | P00915 | 2/20 | 0.32 |
| ▸ | CA2 | P00918 | 2/20 | 0.32 |
| ▸ | CA9 | Q16790 | 2/20 | 0.32 |
| ▸ | CA5A | P35218 | 1/20 | 0.32 |
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 2/20 | 0.31 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.31 |
| ▸ | ABCC9 | O60706 | 1/20 | 0.31 |
| ▸ | ABCC8 | Q09428 | 1/20 | 0.31 |
| ▸ | KCNJ11 | Q14654 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL37032 | 0.83 | GPR3 (0.50) | ALDH1A1GPR3PTPN1HSD11B1CA1 | |
| Trifluoromethanesulfonic Acid SCHEMBL31155703 | 0.83 | GPR3 (0.50) | ALDH1A1GPR3PTPN1HSD11B1CA1 | |
| SCHEMBL245132 | 0.82 | GAA (0.43) | ALDH1A1L3MBTL1PTPN1SMN1; SMN2CYP1A2 | |
| SCHEMBL29745863 | 0.81 | GPR3 (0.40) | ALDH1A1GPR3PTPN1CES1HSD11B1 | |
| Trifluoromethanesulfonic Acid SCHEMBL10008137 | 0.81 | GPR3 (0.48) | GPR3PTPN1HSD11B1CA1CA2 | |
| SCHEMBL2437867 | 0.81 | GPR3 (0.40) | ALDH1A1GPR3PTPN1CES1HSD11B1 | |
| Trifluoromethanesulfonic Acid SCHEMBL6118365 | 0.81 | GPR3 (0.48) | GPR3PTPN1HSD11B1CA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL3249775 | 0.80 | GPR3 (0.44) | GPR3PTPN1CES1HSD11B1CA1 | |
| SCHEMBL547386 | 0.80 | KMT2A (0.34) | CA1CA2SMN1; SMN2MEN1TSHR | |
| SCHEMBL547232 | 0.79 | KMT2A (0.35) | L3MBTL1GPR3PTPN1SMN1; SMN2HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20130137037-A1 | Silicon Compound, Condensation Product, Resist Compostion and Pattern Formation Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-05-30 | — | — | US | disclosed |
| US-8378016-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-02-19 | — | — | US | disclosed |
| US-20110165519-A1 | RESIN SUITABLE FOR AN ACID GENERATOR AND A CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION CONTAINING THE SAME | ANDO NOBUO | 2011-07-07 | — | — | US | disclosed |
| US-7932334-B2 | Resin suitable for an acid generator | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-04-26 | — | — | US | disclosed |
| US-20100203446-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-08-12 | — | — | US | disclosed |
| US-20070149702-A1 | Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED | 2007-06-28 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130137037-A1 | Silicon Compound, Condensation Product, Resist Compostion and Pattern Formation Method | CCNB1, FEM1B, SEM1 | ALDH1A1 3473/4885L3MBTL1 2252/4885GPR3 3271/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.