SCHEMBL16353066

SCHEMBL16353066

C[N+](C)(C)CCSC(=O)CCCC(=O)SCC[N+](C)(C)C

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 1/20 0.60
BLM P54132 2/20 0.58
POLB P06746 1/20 0.58
ATM Q13315 1/20 0.58
ACHE P22303 6/20 0.44
SLC6A4 P31645 1/20 0.38
ADRA2A P08913 1/20 0.38
ADRA1A P35348 1/20 0.38
MAPT P10636 1/20 0.37
SMN1; SMN2 Q16637 3/20 0.35
KDM4E B2RXH2 2/20 0.35
BBOX1 O75936 3/20 0.34
MEN1 O00255 2/20 0.33
NFKB1 P19838 2/20 0.33
KMT2A Q03164 2/20 0.33
LMNA P02545 1/20 0.33
APEX1 P27695 1/20 0.33
HSD17B10 Q99714 1/20 0.33
HRH3 Q9Y5N1 1/20 0.33
TSHR P16473 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16353072 0.95 CYP2C19 (0.60) CYP2C19BLMPOLBATMACHE
SCHEMBL5335351 0.93 CYP2C19 (0.62) CYP2C19BLMPOLBATMACHE
SCHEMBL16353013 0.89 CYP2C19 (0.54) CYP2C19BLMPOLBATMACHE
SCHEMBL570209 0.86 CYP2C19 (0.56) CYP2C19BLMPOLBATMACHE
SCHEMBL16353059 0.85 ADRA2A (0.60) CYP2C19BLMPOLBATMACHE
Iodide SCHEMBL608288 0.85 CYP2C19 (0.54) CYP2C19BLMPOLBATMACHE
Bromide SCHEMBL28898530 0.85 CYP2C19 (0.54) CYP2C19BLMPOLBATMACHE
Hydrochloric Acid SCHEMBL5450062 0.85 BLM (0.57) CYP2C19BLMPOLBATMACHE
SCHEMBL16353068 0.83 CYP2C19 (0.62) CYP2C19BLMPOLBATMACHE
SCHEMBL16353075 0.81 ADRA2A (0.60) CYP2C19BLMPOLBATMACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11720018-B2 Chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-08 US disclosed
US-20230152692-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed
US-20230152692-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed
US-20220004101-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-01-06 US disclosed
US-20210033969-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-02-04 US disclosed
US-20180143532-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-24 US disclosed
US-20180086948-A1 ADHESIVE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING A BIO-ELECTRODE, AND SALT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-29 US disclosed
US-20140377706-A1 DEVELOPER FOR PHOTOSENSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180086948-A1 ADHESIVE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING A BIO-ELECTRODE, AND SALT SLC9A1, FN1, EPCAM CYP2C19 3102/4885BLM 2848/4885POLB 3653/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.