SCHEMBL16449151

SCHEMBL16449151

CC1COC(=O)C1OC(=O)C(C)(C)C

nearest known ligand 0.41

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4569602 0.87 CYP2D6 (0.31)
SCHEMBL47450 0.84 FKBP1A (0.35) SMN1; SMN2
SCHEMBL19413943 0.82
SCHEMBL18922936 0.81
SCHEMBL12650667 0.79
SCHEMBL12650669 0.79 ALDH1A1 (0.30)
SCHEMBL10099520 0.79 ALDH1A1 (0.31)
SCHEMBL686158 0.75 ALDH1A1 (0.38)
SCHEMBL685956 0.75
SCHEMBL2607855 0.74 FKBP1A (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9507258-B2 Resin and photoresist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-11-29 US disclosed
US-9291893-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-03-22 US disclosed
US-8951709-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-02-10 US disclosed