SCHEMBL16612270

SCHEMBL16612270

Cc1ccccc1N([SiH3])[SiH3]

nearest known ligand 0.47

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.47
ACHE P22303 2/20 0.47
CA1 P00915 2/20 0.39
CA2 P00918 2/20 0.39
CA7 P43166 2/20 0.39
CA9 Q16790 2/20 0.39
SIGMAR1 Q99720 1/20 0.38
ALDH1A1 P00352 4/20 0.38
LMNA P02545 2/20 0.37
CYP3A4 P08684 3/20 0.36
TRPM8 Q7Z2W7 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
CYP1A2 P05177 2/20 0.35
CYP2A6 P11509 2/20 0.35
NPC1 O15118 1/20 0.34
RAB9A P51151 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30800114 1.00 TSHR (0.47) TSHRACHECA1CA2CA7
SCHEMBL8280381 0.81 ACHE (0.45) TSHRACHECA1CA2CA7
SCHEMBL6114371 0.77 LMNA (0.44) TSHRACHECA1CA2CA7
SCHEMBL29521738 0.77 TSHR (0.53) TSHRACHECA1CA2CA7
SCHEMBL516435 0.77 TSHR (0.53) TSHRACHECA1CA2CA7
Hydrochloric Acid SCHEMBL9135314 0.74 TSHR (0.50) TSHRACHECA1CA2CA7
SCHEMBL7147098 0.74 TSHR (0.50) TSHRACHECA1CA2CA7
SCHEMBL29239 0.74 TSHR (0.50) TSHRACHECA1CA2CA7
SCHEMBL29435133 0.74 TSHR (0.50) TSHRACHECA1CA2CA7
SCHEMBL2620728 0.74 ACHE (0.50) TSHRACHECA1CA2CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3347504-B1 METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM AND RESULTANT FILMS VERSUM MAT US LLC (US) 2024-09-25 EP claimed
US-11732351-B2 Methods for depositing a conformal metal or metalloid silicon nitride film and resultant films VERSUM MATERIALS US, LLC (US) 2023-08-22 US claimed
US-20210388489-A1 Methods for Depositing a Conformal Metal or Metalloid Silicon Nitride Film and Resultant Films VERSUM MATERIALS US, LLC (US) 2021-12-16 US claimed
US-20180274097-A1 METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM VERSUM MATERIALS US, LLC 2018-09-27 US claimed
US-20180245215-A1 METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM AND RESULTANT FILMS VERSUM MATERIALS US, LLC 2018-08-30 US claimed
EP-3347504-A1 METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM AND RESULTANT FILMS Air Products and Chemicals, Inc. (US) 2018-07-18 EP claimed
US-9905415-B2 Methods for depositing silicon nitride films VERSUM MATERIALS US, LLC (US) 2018-02-27 US claimed
US-20150099375-A1 Methods for Depositing Silicon Nitride Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2015-04-09 US claimed
EP-2857552-A2 Methods for depositing silicon nitride films AIR PRODUCTS AND CHEMICALS, INC. (US) 2015-04-08 EP claimed
US-12163224-B2 Methods for depositing a conformal metal or metalloid silicon nitride film VERSUM MATERIALS US, LLC (US) 2024-12-10 US disclosed
EP-3347504-B1 METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM AND RESULTANT FILMS VERSUM MAT US LLC (US) 2024-09-25 EP disclosed
US-11732351-B2 Methods for depositing a conformal metal or metalloid silicon nitride film and resultant films VERSUM MATERIALS US, LLC (US) 2023-08-22 US disclosed
US-20210388489-A1 Methods for Depositing a Conformal Metal or Metalloid Silicon Nitride Film and Resultant Films VERSUM MATERIALS US, LLC (US) 2021-12-16 US disclosed
EP-3359705-B1 METHODS FOR DEPOSITING A CONFORMAL METAL OR METALLOID SILICON NITRIDE FILM VERSUM MAT US LLC (US) 2021-12-08 EP disclosed
US-9905415-B2 Methods for depositing silicon nitride films VERSUM MATERIALS US, LLC (US) 2018-02-27 US disclosed
US-9905415-B2 Methods for depositing silicon nitride films VERSUM MATERIALS US, LLC (US) 2018-02-27 US disclosed
US-20150099375-A1 Methods for Depositing Silicon Nitride Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2015-04-09 US disclosed
US-20150099375-A1 Methods for Depositing Silicon Nitride Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2015-04-09 US disclosed
EP-2857552-A2 Methods for depositing silicon nitride films AIR PRODUCTS AND CHEMICALS, INC. (US) 2015-04-08 EP disclosed
EP-2857552-A2 Methods for depositing silicon nitride films AIR PRODUCTS AND CHEMICALS, INC. (US) 2015-04-08 EP disclosed