SCHEMBL1664601

SCHEMBL1664601

C1=C2CCC2c2cccc3cccc1c23

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRA2A P08913 1/20 0.40
ADRA2B P18089 1/20 0.40
ADRA2C P18825 1/20 0.40
MAPK1 P28482 3/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
MAPT P10636 2/20 0.33
GAA P10253 1/20 0.30
PLA2G6 O60733 3/20 0.30
ALDH1A1 P00352 2/20 0.30
HPGD P15428 2/20 0.30
CYP3A4 P08684 2/20 0.30
HSD17B10 Q99714 2/20 0.30
MTNR1A P48039 1/20 0.30
MTNR1B P49286 1/20 0.30
FAAH O00519 1/20 0.30
NPC1 O15118 1/20 0.30
GMNN O75496 1/20 0.30
LMNA P02545 1/20 0.30
MTOR P42345 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL775690 0.79 KDM1A (0.35)
SCHEMBL3248949 0.79 KDM1A (0.35)
SCHEMBL6561593 0.77 KDM1A (0.34)
SCHEMBL6560462 0.73 SLC6A2 (0.31)
SCHEMBL577658 0.71 KDM1A (0.39)
SCHEMBL5845510 0.68 TLR4 (0.35) ADRA2AMEN1KMT2AGAAALDH1A1
SCHEMBL15875749 0.68 MEN1 (0.33) MAPK1MEN1KMT2AMAPT
SCHEMBL5844300 0.67 TLR4 (0.42) ADRA2AMEN1KMT2AGAAALDH1A1
SCHEMBL8931480 0.66 KDM4E (0.30) MEN1KMT2AMAPTALDH1A1
SCHEMBL6561523 0.66 KDM1A (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110785159-B Dual paste type curable dental composition 可乐丽则武齿科株式会社 2023-06-09 CN disclosed
CN-110785159-A Dual paste type dental curable composition 可乐丽则武齿科株式会社 2020-02-11 CN disclosed
US-20110136992-A1 COMPOSITION FOR INSULATING LAYER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-06-09 US disclosed
EP-2311915-A1 COMPOSITION FOR INSULATING LAYER Sumitomo Chemical Company, Limited (JP) 2011-04-20 EP disclosed