Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MYC | P01106 | 2/20 | 0.57 |
| ▸ | AKR1C3 | P42330 | 2/20 | 0.55 |
| ▸ | GAA | P10253 | 1/20 | 0.52 |
| ▸ | MAPT | P10636 | 1/20 | 0.52 |
| ▸ | POLB | P06746 | 1/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.49 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.49 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.49 |
| ▸ | ATM | Q13315 | 1/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.48 |
| ▸ | HPGD | P15428 | 2/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.47 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.46 |
| ▸ | KCNK3 | O14649 | 1/20 | 0.46 |
| ▸ | KCNK9 | Q9NPC2 | 1/20 | 0.46 |
| ▸ | MAPK14 | Q16539 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31738885 | 1.00 | MYC (0.57) | MYCAKR1C3GAAMAPTPOLB | |
| SCHEMBL350625 | 0.92 | MYC (0.62) | MYCAKR1C3GAAMAPTPOLB | |
| SCHEMBL3207316 | 0.91 | MYC (0.53) | MYCAKR1C3GAAMAPTPOLB | |
| SCHEMBL29215698 | 0.90 | AKR1C3 (0.59) | MYCAKR1C3GAAMAPTPOLB | |
| SCHEMBL51520 | 0.90 | AKR1C3 (0.59) | MYCAKR1C3POLBALDH1A1KMT2A | |
| SCHEMBL38662722 | 0.90 | AKR1C3 (0.59) | MYCAKR1C3POLBALDH1A1KMT2A | |
| SCHEMBL8547538 | 0.89 | MYC (0.51) | MYCAKR1C3GAAMAPTPOLB | |
| SCHEMBL8547541 | 0.89 | MYC (0.51) | MYCAKR1C3GAAMAPTPOLB | |
| SCHEMBL3039645 | 0.87 | ALDH1A1 (0.59) | MYCAKR1C3MAPTPOLBALDH1A1 | |
| Benzoic Acid SCHEMBL28093184 | 0.87 | AKR1C3 (0.55) | MYCAKR1C3POLBALDH1A1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108060308-B | Method and device for separating lithium from lithium-containing solution | 中南大学 | 2020-01-03 | — | — | CN | claimed |
| CN-108060308-A | A kind of method and device of the separating Li from lithium-containing solution | 中南大学 | 2018-05-22 | — | — | CN | claimed |
| CN-115215727-B | High energy efficiency preparation method of alkali metal alkoxide | 赢创运营有限公司 | 2024-03-01 | — | — | CN | disclosed |
| CN-115215728-B | High energy efficiency preparation method of alkali metal alkoxide | 赢创运营有限公司 | 2024-02-09 | — | — | CN | disclosed |
| CN-115215728-A | High-energy-efficiency preparation method of alkali metal alkoxide | 赢创功能性解决方案有限公司 | 2022-10-21 | — | — | CN | disclosed |
| CN-109790137-B | Polycyclic glyoxylic acid esters as photoinitiators | IGM集团公司 | 2020-10-30 | — | — | CN | disclosed |
| CN-110741463-A | Method for producing substrate with fine uneven pattern, resin composition, and laminate | 三井化学株式会社 | 2020-01-31 | — | — | CN | disclosed |
| CN-108060308-B | Method and device for separating lithium from lithium-containing solution | 中南大学 | 2020-01-03 | — | — | CN | disclosed |
| CN-108060308-A | A kind of method and device of the separating Li from lithium-containing solution | 中南大学 | 2018-05-22 | — | — | CN | disclosed |
| EP-1830228-B1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2015-08-05 | — | — | EP | disclosed |
| EP-2808736-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-12-03 | — | — | EP | disclosed |
| US-20130004896-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION SPECIFICATION | ECHIGO MASATOSHI (JP) | 2013-01-03 | — | — | US | disclosed |
| US-20110165516-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | ECHIGO MASATOSHI | 2011-07-07 | — | — | US | disclosed |
| CN-101088046-B | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO | 2011-05-25 | — | — | CN | disclosed |
| US-7919223-B2 | Polyphenol compound synthesized by condensation between aromatic ketone or aldehyde and a phenol; acid-amplified, non-polymeric resist; highly sensitive to KrF excimer lasers, extreme ultraviolet rays, electron beams, X-rays; resist patterns with high resolution, high heat, etch resistance | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2011-04-05 | — | — | US | disclosed |
| US-20080113294-A1 | Compound for Resist and Radiation-Sensitive Composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-05-15 | — | — | US | disclosed |
| CN-101088046-A | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2007-12-12 | — | — | CN | disclosed |
| EP-1830228-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-09-05 | — | — | EP | disclosed |
| US-6458972-B1 | THERMAL CLEAVAGE OF MACROCYCLIC ESTERS IN THE PRESENCE OF A THERMOSTABLE BENZENE DERIVATIVE | HAARMANN & REIMER GMBH (DE) | 2002-10-01 | — | — | US | disclosed |
| US-20020095045-A1 | Process for the preparation of macrocyclic esters | SYMRISE GMBH & CO., KG (DE) | 2002-07-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110165516-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | XRCC6, XRCC5, KISS1R | MYC 3041/4885AKR1C3 782/4885GAA 2468/4885 |
| US-20020095045-A1 | Process for the preparation of macrocyclic esters | CYP3A4, CYP4A11, CASP14 | MYC 468/4885AKR1C3 299/4885GAA 814/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.