Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.59 |
| ▸ | ATM | Q13315 | 1/20 | 0.57 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.57 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.57 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.55 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.54 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.52 |
| ▸ | CDC25A | P30304 | 1/20 | 0.52 |
| ▸ | CDC25B | P30305 | 1/20 | 0.52 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.52 |
| ▸ | CES2 | O00748 | 1/20 | 0.52 |
| ▸ | CES1 | P23141 | 1/20 | 0.52 |
| ▸ | HTT | P42858 | 1/20 | 0.52 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.52 |
| ▸ | NPC1 | O15118 | 3/20 | 0.50 |
| ▸ | POLB | P06746 | 2/20 | 0.50 |
| ▸ | AKR1C3 | P42330 | 2/20 | 0.50 |
| ▸ | CYP2C8 | P10632 | 1/20 | 0.50 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.50 |
| ▸ | MITF | O75030 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10782252 | 0.93 | HTT (0.64) | ALDH1A1ATMTDP1L3MBTL1KDM4E | |
| SCHEMBL27406781 | 0.89 | KDM4E (0.66) | ALDH1A1KDM4EPTGS2SRD5A2CDC25A | |
| SCHEMBL4400929 | 0.88 | AKR1C3 (0.57) | ALDH1A1ATMTDP1L3MBTL1KDM4E | |
| SCHEMBL8756315 | 0.87 | ALDH1A1 (0.50) | ALDH1A1ATMTDP1L3MBTL1KDM4E | |
| SCHEMBL7481641 | 0.87 | TDP1 (0.52) | ALDH1A1ATMTDP1L3MBTL1KDM4E | |
| SCHEMBL29060736 | 0.87 | ALDH1A1 (0.62) | ALDH1A1TDP1HSD17B10CES2CES1 | |
| SCHEMBL12337417 | 0.86 | ALDH1A1 (0.61) | ALDH1A1ATMTDP1L3MBTL1KDM4E | |
| SCHEMBL15759866 | 0.86 | ATM (0.60) | ALDH1A1ATMTDP1L3MBTL1PTGS2 | |
| SCHEMBL7915439 | 0.86 | CYP2C8 (0.60) | ALDH1A1ATMTDP1L3MBTL1KDM4E | |
| SCHEMBL305558 | 0.85 | NPSR1 (0.60) | ALDH1A1PTGS2CES2CES1HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108060308-B | Method and device for separating lithium from lithium-containing solution | 中南大学 | 2020-01-03 | — | — | CN | claimed |
| CN-115215728-A | High-energy-efficiency preparation method of alkali metal alkoxide | 赢创功能性解决方案有限公司 | 2022-10-21 | — | — | CN | disclosed |
| CN-108060308-B | Method and device for separating lithium from lithium-containing solution | 中南大学 | 2020-01-03 | — | — | CN | disclosed |
| EP-1830228-B1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2015-08-05 | — | — | EP | disclosed |
| EP-2808736-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-12-03 | — | — | EP | disclosed |
| US-8802353-B2 | Compound for resist and radiation-sensitive composition specification | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-08-12 | — | — | US | disclosed |
| EP-2662727-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-11-13 | — | — | EP | disclosed |
| US-8350096-B2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-01-08 | — | — | US | disclosed |
| US-20130004896-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION SPECIFICATION | ECHIGO MASATOSHI (JP) | 2013-01-03 | — | — | US | disclosed |
| US-20110165516-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | ECHIGO MASATOSHI | 2011-07-07 | — | — | US | disclosed |
| US-7919223-B2 | Polyphenol compound synthesized by condensation between aromatic ketone or aldehyde and a phenol; acid-amplified, non-polymeric resist; highly sensitive to KrF excimer lasers, extreme ultraviolet rays, electron beams, X-rays; resist patterns with high resolution, high heat, etch resistance | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2011-04-05 | — | — | US | disclosed |
| US-20080113294-A1 | Compound for Resist and Radiation-Sensitive Composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-05-15 | — | — | US | disclosed |
| EP-1830228-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-09-05 | — | — | EP | disclosed |
| US-6458972-B1 | THERMAL CLEAVAGE OF MACROCYCLIC ESTERS IN THE PRESENCE OF A THERMOSTABLE BENZENE DERIVATIVE | HAARMANN & REIMER GMBH (DE) | 2002-10-01 | — | — | US | disclosed |
| US-20020095045-A1 | Process for the preparation of macrocyclic esters | SYMRISE GMBH & CO., KG (DE) | 2002-07-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110165516-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | XRCC6, XRCC5, KISS1R | ALDH1A1 1170/4885ATM 267/4885TDP1 1518/4885 |
| US-20020095045-A1 | Process for the preparation of macrocyclic esters | CYP3A4, CYP4A11, CASP14 | ALDH1A1 2102/4885ATM 1826/4885TDP1 2295/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.