SCHEMBL16705258

SCHEMBL16705258

CCCC(C)(CC)C(=O)OCc1ccc(O)c2ccccc12

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ IDO1 P14902 4/20 0.35
▸ KDM4E B2RXH2 3/20 0.34
▸ NPC1 O15118 2/20 0.34
▸ L3MBTL1 Q9Y468 2/20 0.34
▸ EP300 Q09472 1/20 0.34
▸ BRD4 O60885 1/20 0.34
▸ MITF O75030 1/20 0.34
▸ CHRM2 P08172 2/20 0.33
▸ CHRM4 P08173 2/20 0.33
▸ CHRM5 P08912 2/20 0.33
▸ CHRM1 P11229 2/20 0.33
▸ CHRM3 P20309 2/20 0.33
▸ CDC25B P30305 1/20 0.33
▸ ESR1 P03372 1/20 0.33
▸ ESR2 Q92731 1/20 0.33
▸ RAB9A P51151 2/20 0.32
▸ ALOX12 P18054 1/20 0.32
▸ HTT P42858 1/20 0.32
▸ NPSR1 Q6W5P4 1/20 0.32
▸ LDHA P00338 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17424794 0.92 IAPP (0.36) EP300CHRM2CHRM4CHRM5CHRM1
SCHEMBL17901893 0.92 IDO1 (0.37) IDO1KDM4ENPC1L3MBTL1EP300
SCHEMBL15189314 0.84 CDC25B (0.39) KDM4ECHRM2CHRM4CHRM5CHRM1
SCHEMBL8737838 0.84 RIPK1 (0.40) IDO1KDM4ENPC1L3MBTL1EP300
SCHEMBL18671830 0.82 IDO1 (0.35) IDO1KDM4ENPC1L3MBTL1EP300
SCHEMBL15189296 0.79 ESR1 (0.40) IDO1L3MBTL1EP300ESR1ESR2
SCHEMBL13705680 0.76 ALDH1A1 (0.50) KDM4EL3MBTL1ALDH1A1MAPTKMT2A
SCHEMBL8738362 0.76 CDC25B (0.39) CHRM2CHRM4CHRM5CHRM1CHRM3
SCHEMBL20332439 0.75 IDO1 (0.34) IDO1KDM4ENPC1EP300CHRM2
SCHEMBL14477138 0.75 IDO1 (0.34) IDO1KDM4ENPC1CHRM2CHRM4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2455811-B1 Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method SHINETSU CHEMICAL CO (JP) 2016-01-13 — — EP disclosed
EP-2256551-B1 Pattern forming process using a chemically amplified resist composition SHINETSU CHEMICAL CO (JP) 2015-05-13 — — EP disclosed
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