SCHEMBL14477138

SCHEMBL14477138

CC(C)(C)CC(C)(C(=O)OCc1ccc(O)c2ccccc12)C(C)(C)C

nearest known ligand 0.40

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ IDO1 P14902 5/20 0.34
▸ CHRM2 P08172 2/20 0.34
▸ CHRM4 P08173 2/20 0.34
▸ CHRM5 P08912 2/20 0.34
▸ CHRM1 P11229 2/20 0.34
▸ CHRM3 P20309 2/20 0.34
▸ KDM4E B2RXH2 1/20 0.33
▸ NPC1 O15118 1/20 0.33
▸ ALOX12 P18054 1/20 0.33
▸ HTT P42858 1/20 0.33
▸ RAB9A P51151 1/20 0.33
▸ NPSR1 Q6W5P4 1/20 0.33
▸ LDHA P00338 1/20 0.33
▸ CTSB P07858 1/20 0.32
▸ CDC25B P30305 1/20 0.32
▸ GCGR P47871 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14577613 0.92 CYBB (0.34) CHRM2CHRM4CHRM5CHRM1CHRM3
SCHEMBL8737838 0.80 RIPK1 (0.40) IDO1CHRM2CHRM4CHRM5CHRM1
SCHEMBL17901893 0.80 IDO1 (0.37) IDO1CHRM2CHRM4CHRM5CHRM1
SCHEMBL20332439 0.79 IDO1 (0.34) IDO1CHRM2CHRM4CHRM5CHRM1
SCHEMBL13161550 0.78 ESR1 (0.41) IDO1NPC1RAB9ANPSR1
SCHEMBL18671830 0.77 IDO1 (0.35) IDO1CHRM2CHRM4CHRM5CHRM1
SCHEMBL1687588 0.76 ALDH1A1 (0.51) NPC1RAB9A
SCHEMBL16705258 0.75 IDO1 (0.35) IDO1CHRM2CHRM4CHRM5CHRM1
SCHEMBL13749702 0.75 EPHX1 (0.44) KDM4ENPC1
SCHEMBL19558277 0.75 KDM4E (0.44) CHRM2CHRM4CHRM5CHRM1CHRM3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11131926-B2 Resist composition and resist patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-28 — — US disclosed
US-9720323-B2 Chemically amplified positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-08-01 — — US disclosed
US-9645493-B2 Negative resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-09 — — US disclosed
US-20070072115-A1 Positive resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-03-29 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11131926-B2 Resist composition and resist patterning process SLC11A2, RER1, GPS1 IDO1 4786/4885CHRM2 4438/4885CHRM4 4637/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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