Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16769836 | 0.84 | LMNA (0.35) | LMNAALDH1A1TSHRCYP3A4CYP2D6 | |
| SCHEMBL13556145 | 0.82 | CYP17A1 (0.33) | LMNAALDH1A1 | |
| SCHEMBL13556139 | 0.81 | PRKCA (0.38) | LMNAALDH1A1 | |
| SCHEMBL13556142 | 0.81 | CYP17A1 (0.33) | ALDH1A1 | |
| SCHEMBL13556141 | 0.77 | CYP19A1 (0.33) | ALDH1A1TSHR | |
| SCHEMBL13556144 | 0.77 | PRKCA (0.36) | LMNAALDH1A1 | |
| SCHEMBL13556132 | 0.75 | — | — | |
| SCHEMBL16547493 | 0.75 | CYP17A1 (0.34) | LMNAALDH1A1 | |
| SCHEMBL13556133 | 0.75 | MMP8 (0.34) | — | |
| SCHEMBL16682462 | 0.74 | ALDH1A1 (0.47) | LMNAALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9726974-B2 | Resin, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| US-20150153644-A1 | RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-06-04 | — | — | US | disclosed |