SCHEMBL23964605

SCHEMBL23964605

C=C(C)C(=O)OC(C)(C)C1CCC(F)(F)CC1

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.33
ALDH1A1 P00352 2/20 0.32
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22733573 0.90 CHRM2 (0.33) ALDH1A1
SCHEMBL674286 0.86 ALDH1A1 (0.39) ALDH1A1TSHR
SCHEMBL22733574 0.84 TSHR (0.33) EPHX2ALDH1A1TSHR
SCHEMBL16807394 0.82 ALDH1A1 (0.37) ALDH1A1TSHR
SCHEMBL9610296 0.82 ALDH1A1 (0.37) ALDH1A1TSHR
SCHEMBL22733020 0.81 ALDH1A1 (0.31) EPHX2ALDH1A1TSHR
SCHEMBL106840 0.81 ALDH1A1 (0.35) ALDH1A1
SCHEMBL15472998 0.81 EPHX1 (0.36) EPHX2ALDH1A1
SCHEMBL2735083 0.79 ALDH1A1 (0.34) ALDH1A1
SCHEMBL18776052 0.79 ALDH1A1 (0.34) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021215163-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN JSR株式会社 (JP) 2021-10-28 WO disclosed