SCHEMBL1703068

SCHEMBL1703068

C=C(C)C(=O)OC1CCC(C)(C)N(C)C1(C)C

nearest known ligand 0.32

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 1/20 0.32
ALDH1A1 P00352 1/20 0.31
TSHR P16473 1/20 0.30
NFKB1 P19838 1/20 0.30
CYP2C19 P33261 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3233721 0.84 KMT2A (0.32) KMT2AALDH1A1
SCHEMBL2202765 0.78 TSHR (0.30) TSHRNFKB1CYP2C19
SCHEMBL8869611 0.78 ALDH1A1 (0.37) KMT2AALDH1A1TSHRNFKB1CYP2C19
Hydrochloric Acid SCHEMBL10593147 0.78 TSHR (0.32) TSHRNFKB1CYP2C19
SCHEMBL8147768 0.75 SMN1; SMN2 (0.37) ALDH1A1
SCHEMBL114192 0.74 NAAA (0.40) ALDH1A1
SCHEMBL8866100 0.71
SCHEMBL6873016 0.71 TSHR (0.30) TSHRNFKB1CYP2C19
SCHEMBL8854706 0.70 TSHR (0.39) KMT2AALDH1A1TSHRNFKB1CYP2C19
SCHEMBL67638 0.70 TSHR (0.39) KMT2AALDH1A1TSHRNFKB1CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 165 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12486352-B2 Composition, and optical material and lens using same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-12-02 US claimed
US-20240052105-A1 COMPOSITION, AND OPTICAL MATERIAL AND LENS USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-02-15 US claimed
US-20230374191-A1 COMPOSITION, AND OPTICAL MATERIAL AND LENS USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-11-23 US claimed
EP-4270094-A1 COMPOSITION, AND OPTICAL MATERIAL AND LENS USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-11-01 EP claimed
US-20230339921-A1 COMPOSITION, AND OPTICAL MATERIAL AND LENS USING SAID COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-10-26 US claimed
EP-4230616-A1 COMPOSITION, AND OPTICAL MATERIAL AND LENS USING SAID COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-08-23 EP claimed
EP-4206187-A1 COMPOSITION, AND OPTICAL MATERIAL AND LENS USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-07-05 EP claimed
EP-4738010-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT COMPRISING SAME Toray Industries, Inc. (JP) 2026-05-06 EP disclosed
US-12486352-B2 Composition, and optical material and lens using same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-12-02 US disclosed
WO-2025245032-A1 METHODS OF MANUFACTURING A BIFUNCTIONAL COMPOUND ARVINAS OPERATIONS, INC. (US) 2025-11-27 WO disclosed
US-20250326740-A1 METHODS OF MANUFACTURING A BIFUNCTIONAL COMPOUND ARVINAS OPERATIONS INC (US) 2025-10-23 US disclosed
US-12286419-B2 Methods of manufacturing a bifunctional compound ARVINAS OPERATIONS, INC. (US) 2025-04-29 US disclosed
WO-2025005146-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, METHOD FOR FORMING RESIST PATTERN, AND LIKE 旭化成株式会社 2025-01-02 WO disclosed
EP-1144496-A1 POLYMERIC STABILIZERS HAVING LOW POLYDISPERSITY Ciba SC Holding AG (CH) 2001-10-17 EP disclosed
US-6251986-B1 WATER BASED PAINT NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CORPORATION 2001-06-26 US disclosed
WO-2000039209-A1 POLYMERIC STABILIZERS HAVING LOW POLYDISPERSITY CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2000-07-06 WO disclosed
EP-0896608-A1 A PAINT RESIN EMULSION HAVING WEATHERABILITY National Starch and Chemical Investment Holding Corporation (US) 1999-02-17 EP disclosed
WO-1998034991-A1 A PAINT RESIN EMULSION HAVING WEATHERABILITY NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CORPORATION (US) 1998-08-13 WO disclosed
EP-0581520-A1 Polyphenylene ether resin compositions with improved light resistance GE PLASTICS JAPAN LIMITED (JP) 1994-02-02 EP disclosed
EP-0083308-B2 PROCESS FOR STABILISING FUNGICIDES CIBA-GEIGY AG (CH) 1990-10-24 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12286419-B2 Methods of manufacturing a bifunctional compound PAICS, WRN, JMJD7 KMT2A 1021/4885ALDH1A1 477/4885TSHR 4348/4885
US-20250326740-A1 METHODS OF MANUFACTURING A BIFUNCTIONAL COMPOUND PAICS, WRN, JMJD7 KMT2A 1021/4885ALDH1A1 477/4885TSHR 4348/4885
US-20230339921-A1 COMPOSITION, AND OPTICAL MATERIAL AND LENS USING SAID COMPOSITION CRYAA, UACA, CRYZ KMT2A 1143/4885ALDH1A1 2424/4885TSHR 2150/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.