Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | MAP3K14 | Q99558 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | CRBN | Q96SW2 | 2/20 | 0.31 |
| ▸ | DDB1 | Q16531 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL114368 | 0.90 | MAP3K14 (0.38) | MEN1KMT2ANPC1MAP3K14CRBN | |
| SCHEMBL2573073 | 0.89 | NPC1 (0.38) | NPC1CRBN | |
| SCHEMBL112503 | 0.88 | ALDH1A1 (0.38) | NPC1 | |
| SCHEMBL17065493 | 0.83 | MAP3K14 (0.33) | MAP3K14 | |
| SCHEMBL1028532 | 0.82 | MAP3K14 (0.40) | MEN1TSHRKMT2AMAP3K14GAA | |
| Sulfuric Acid SCHEMBL4970729 | 0.82 | MAP3K14 (0.43) | MEN1KMT2AMAP3K14CRBN | |
| Alcohol SCHEMBL28225153 | 0.80 | MAP3K14 (0.41) | MEN1TSHRKMT2ANPC1MAP3K14 | |
| Ethane SCHEMBL28857929 | 0.78 | MAP3K14 (0.46) | MEN1TSHRKMT2ANPC1MAP3K14 | |
| SCHEMBL15494454 | 0.78 | — | — | |
| SCHEMBL11288 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108008600-A | Radiation-ray sensitive composition | 三菱瓦斯化学株式会社 | 2018-05-08 | — | — | CN | disclosed |
| CN-104981463-B | Compound, lower layer film for lithography form material, lower layer film for lithography and pattern formation method | 三菱瓦斯化学株式会社 | 2018-04-13 | — | — | CN | disclosed |
| CN-103733136-B | Underlayer film forming material for lithography, underlayer film for lithography, and pattern forming method | 三菱瓦斯化学株式会社 | 2017-06-23 | — | — | CN | disclosed |
| WO-2016060856-A1 | DISPERSED CARBON-COATED METAL PARTICLES, ARTICLES AND USES | EASTMAN KODAK COMPANY (US) | 2016-04-21 | — | — | WO | disclosed |
| WO-2015199988-A1 | LATEX PRIMER COMPOSITION AND LATEX PRIMED SUBSTRATES | EASTMAN KODAK COMPANY (US) | 2015-12-30 | — | — | WO | disclosed |
| WO-2015134084-A1 | PHOTOPOLYMERIZABLE COMPOSITIONS FOR ELECTROLESS PLATING METHODS | EASTMAN KODAK COMPANY (US) | 2015-09-11 | — | — | WO | disclosed |